Patents-Review.com
ClassID:

205340 ⎘

H01J37/32559 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Electrodes Protection means, e.g. coatings

Recent Application in this class:
#1
20260106108
2026-04-16

SHAPED ION BLOCKER PLATE FOR INDIRECT CCP

 #2
20260074158
2026-03-12

VERTICAL PLASMA SOURCE

 #3
20260066240
2026-03-05

ADJUSTABLE GROUNDING AND BIASING AREA

 #4
20260066231
2026-03-05

PLASMA GENERATOR AND INJECTOR ASSEMBLY FOR A PROCESSING CHAMBER, and related METHODS

 #5
20260004998
2026-01-01

PLASMA PROCESSING APPARATUS AND REACTION TUBE WALL PROTECTION MEMBER

 #6
20250364229
2025-11-27

CERAMIC JOINED BODY, ELECTROSTATIC CHUCK DEVICE, AND METHOD FOR MANUFACTURING CERAMIC JOINED BODY

 #7
20250308858
2025-10-02

PLASMA PROCESSING APPARATUS

 #8
20250246413
2025-07-31

COATED PART FOR PLASMA PROCESSING CHAMBER

 #9
20250210320
2025-06-26

FILM-FORMING DEVICE

 #10
20250166970
2025-05-22

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

 #11
20250054735
2025-02-13

EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

 #12
20240420914
2024-12-19

COATING METHOD

 #13
20240304425
2024-09-12

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

 #14
20240297024
2024-09-05

ACTIVE GAS GENERATION APPARATUS

 #15
20240249922
2024-07-25

PLASMA PROCESSING APPARATUS

 #16
20240234099
2024-07-11

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

 #17
20240186120
2024-06-06

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

 #18
20240066161
2024-02-29

METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMPERATURE PLASMA

 #19
20240055237
2024-02-15

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #20
20230402263
2023-12-14

PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM

 #21
20230395354
2023-12-07

Control of plasma sheath with bias supplies

 #22
20230343563
2023-10-26

SUBSTRATE TREATING APPARATUS

 #23
20230332564
2023-10-19

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

 #24
20230282459
2023-09-07

BATCH TYPE SUBSTRATE PROCESSING APPARATUS

 #25
20230253191
2023-08-10

Batch type substrate processing apparatus

 #26
20230253190
2023-08-10

Deposition apparatus and deposition method using the same

 #27
20230203657
2023-06-29

Ceramic showerheads with conductive electrodes

 #28
20230141782
2023-05-11

PROTECTIVE METAL OXY-FLUORIDE COATINGS

 #29
20230116058
2023-04-13

Spatial control of plasma processing environments

 #30
20220328289
2022-10-13

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

 #31
20220298995
2022-09-22

Intake plasma generator systems and methods

 #32
20220285135
2022-09-08

Substrate processing apparatus

 #33
20220285131
2022-09-08

Spatial monitoring and control of plasma processing environments

 #34
20220238305
2022-07-28

Gas discharge tube having glass seal

 #35
20220208516
2022-06-30

APPARATUS FOR TREATING SUBSTRATE AND ASSEMBLY FOR DISTRIBUTING GAS

 #36
20220205079
2022-06-30

ANODE FOR PVD PROCESSES

 #37
20220181125
2022-06-09

Substrate processing apparatus, plasma generating apparatus, and method of manufacturing semiconductor device

 #38
20220148843
2022-05-12

Apparatus and system including high angle extraction optics

 #39
20220115214
2022-04-14

Laminated aerosol deposition coating for aluminum components for plasma processing chambers

 #40
20220081774
2022-03-17

Vacuum processing apparatus and method of cleaning vacuum processing apparatus

 #41
20220044914
2022-02-10

Plasma processing apparatus and plasma processing method

 #42
20220037118
2022-02-03

Plasma processing apparatus and plasma processing method

 #43
20210393827
2021-12-23

Scrubbing device for cleaning, sanitizing or disinfecting

 #44
20210375595
2021-12-02

Deposition apparatus and deposition method using the same

 #45
20210366691
2021-11-25

Forming method of component and plasma processing apparatus

 #46
20210351047
2021-11-11

Cleaning solution production systems and methods, and plasma reaction tanks

 #47
20210343495
2021-11-04

Metal ion source emitting device

 #48
20210287870
2021-09-16

Coating apparatus and coating method

 #49
20210287869
2021-09-16

Coating Apparatus and Coating Method

 #50
20210272773
2021-09-02

Methods for fabricating gas discharge tubes

 #51
20210241996
2021-08-05

Spatial monitoring and control of plasma processing environments

 #52
20210199076
2021-07-01

Intake plasma generator systems and methods

 #53
20210189564
2021-06-24

Ceramic showerheads with conductive electrodes

 #54
20210166923
2021-06-03

Plasma source for rotating susceptor

 #55
20210118703
2021-04-22

Rare-earth oxide based coatings based on ion assisted deposition

 #56
20210111005
2021-04-15

MEMBER, MANUFACTURING METHOD OF MEMBER AND SUBSTRATE PROCESSING APPARATUS

 #57
20210090861
2021-03-25

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #58
20210074517
2021-03-11

Plasma processing apparatus and control method

 #59
20210051791
2021-02-18

Plasma generator and information processing method

 #60
20210013005
2021-01-14

Process control enabled VDC sensor for plasma process

 #61
20210005428
2021-01-07

Spatial monitoring and control of plasma processing environments

 #62
20210002754
2021-01-07

Component for use in plasma processing apparatus, plasma processing apparatus, and method for manufacturing the component

 #63
20200365376
2020-11-19

Protective material ring

 #64
20200350145
2020-11-05

Batch type substrate processing apparatus

 #65
20200350144
2020-11-05

Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

 #66
20200312634
2020-10-01

Plasma processing apparatus

 #67
20200312632
2020-10-01

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

 #68
20200299824
2020-09-24

Arc source with confined magnetic field

 #69
20200255932
2020-08-13

ARC source

 #70
20200224313
2020-07-16

Ceramic showerheads with conductive electrodes

 #71
20200211826
2020-07-02

Plasma processing apparatus and plasma processing method

 #72
20200144033
2020-05-07

LOWER ELECTRODE AND DRY ETCHING MACHINE

 #73
20200049109
2020-02-13

Intake oxidant generator systems and methods

 #74
20200035515
2020-01-30

Cleaning solution production systems and methods, and plasma reaction tanks

 #75
20190385826
2019-12-19

PLASMA PROCESSING DEVICE

 #76
20190338408
2019-11-07

COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS

 #77
20190218662
2019-07-18

Pre-coating method and film forming method

 #78
20190172687
2019-06-06

Ring-shaped electrode

 #79
20190157043
2019-05-23

Spatial and temporal control of ion bias voltage for plasma processing

 #80
20190108985
2019-04-11

Batch type plasma substrate processing apparatus

 #81
20190074162
2019-03-07

Glass sealed gas discharge tubes

 #82
20190051499
2019-02-14

Multi-plate faceplate for a processing chamber

 #83
20190019657
2019-01-17

Atomic layer deposition apparatus

 #84
20180330927
2018-11-15

Plasma source for rotating susceptor

 #85
20180294147
2018-10-11

Plasma processing apparatus

 #86
20180286691
2018-10-04

Etching method and etching apparatus

 #87
20180261434
2018-09-13

Insulating structure

 #88
20180247799
2018-08-30

Deposition apparatus and physical vapor deposition chamber

 #89
20180231587
2018-08-16

Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same

 #90
20180218885
2018-08-02

Wafer support

 #91
20180214586
2018-08-02

Scrubbing device for cleaning, sanitizing or disinfecting

 #92
20180197722
2018-07-12

CATHODE WITH IMPROVED RF POWER EFFICIENCY FOR SEMICONDUCTOR PROCESSING EQUIPMENT WITH RF PLASMA

 #93
20180138016
2018-05-17

Controlling etch rate drift and particles during plasma processing

 #94
20180100228
2018-04-12

Rare-earth oxide based coatings based on ion assisted deposition

 #95
20170345666
2017-11-30

Plasma processing method

 #96
20170338083
2017-11-23

Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

 #97
20170323772
2017-11-09

Protective metal oxy-fluoride coatings

 #98
20170287579
2017-10-05

Ion source repeller shield comprising a labyrinth seal

 #99
20170040148
2017-02-09

Hollow RF feed with coaxial DC power feed

 #100
20160372299
2016-12-22

Plasma processing apparatus and plasma processing method

 #101
20160307741
2016-10-20

Method for surface treatment of upper electrode, plasma processing apparatus and upper electrode

 #102
20160203954
2016-07-14

Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same

 #103
20160184966
2016-06-30

Method of manufacturing an upper electrode of a plasma processing device

 #104
20160086776
2016-03-24

Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly

 #105
20160064215
2016-03-03

Methods for processing bevel edge etching

 #106
20160042924
2016-02-11

Plasma generation chamber with smooth plasma resistant coating

 #107
20160013081
2016-01-14

Plasma-processing apparatus with upper electrode plate and method for performing plasma treatment process

 #108
20160013027
2016-01-14

Film forming device

 #109
20160010200
2016-01-14

Component for use in plasma processing apparatus, plasma processing apparatus, and method for manufacturing the component

 #110
20150332916
2015-11-19

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #111
20150325416
2015-11-12

Plasma processing chamber with a grounded electrode assembly

 #112
20150243486
2015-08-27

PLASMA PROCESSING APPARATUS

 #113
20150238972
2015-08-27

Method and device for fragmenting and/or weakening material by means of high-voltage pulses

 #114
20150206722
2015-07-23

Lower electrode and plasma processing apparatus

 #115
20150200076
2015-07-16

System and methods for plasma application

 #116
20150072537
2015-03-12

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #117
20150027635
2015-01-29

Plasma processing apparatus

 #118
20140306597
2014-10-16

PLASMA GENERATING APPARATUS

 #119
20140272459
2014-09-18

Corrosion resistant aluminum coating on plasma chamber components

 #120
20140217881
2014-08-07

Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma

 #121
20140174359
2014-06-26

PLASMA GENERATOR AND CVD DEVICE

 #122
20140020709
2014-01-23

Plasma etching apparatus and plasma cleaning method

 #123
20130344651
2013-12-26

Discharge surface treatment apparatus and discharge surface treatment method

 #124
20130228124
2013-09-05

Substrate support with ceramic insulation

 #125
20130174984
2013-07-11

Reactive-species supply device and surface treatment apparatus

 #126
20130084409
2013-04-04

Method and device for atmospheric pressure plasma treatment

 #127
20130011581
2013-01-10

PROTECTIVE DEVICE FOR ELECTRODE HOLDERS IN CVD REACTORS

 #128
20120193456
2012-08-02

Gas distribution plate with discrete protective elements

 #129
20120175063
2012-07-12

Substrate processing apparatus

 #130
20110303643
2011-12-15

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

 #131
20110206833
2011-08-25

EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF MANUFACTURE THEREOF

 #132
20110174441
2011-07-21

Plasma processing apparatus

 #133
20110101862
2011-05-05

System and methods for plasma application

 #134
20110083809
2011-04-14

Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly

 #135
20110081477
2011-04-07

Plasma activated chemical vapour deposition method and apparatus therefor

 #136
20110024048
2011-02-03

PLASMA PROCESSING APPARATUS

 #137
20100316815
2010-12-16

Plasma CVD method

 #138
20100288197
2010-11-18

Anodized showerhead

 #139
20100279028
2010-11-04

Methods and arrangements for managing plasma confinement

 #140
20100276283
2010-11-04

Vacuum coating unit for homogeneous PVD coating

 #141
20100263592
2010-10-21

Plasma processing chamber with a grounded electrode assembly

 #142
20100212148
2010-08-26

Method for production of substrate electrode for plasma processing

 #143
20100147794
2010-06-17

Substrate plasma treatment using magnetic mask device

 #144
20100147219
2010-06-17

HIGH TEMPERATURE AND HIGH VOLTAGE ELECTRODE ASSEMBLY DESIGN

 #145
20100140221
2010-06-10

PLASMA ETCHING APPARATUS AND PLASMA CLEANING METHOD

 #146
20100055347
2010-03-04

Activated gas injector, film deposition apparatus, and film deposition method

 #147
20100051592
2010-03-04

Electrode design for plasma processing chamber

 #148
20100003826
2010-01-07

Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof

 #149
20090325320
2009-12-31

Processes for reconditioning multi-component electrodes

 #150
20090294066
2009-12-03

Dry Etching Apparatus

 #151
20090194507
2009-08-06

APPARATUS AND METHOD FOR CLEANING, ETCHING, ACTIVATION AND SUBSEQUENT TREATMENT OF GLASS SURFACES, GLASS SURFACES COATED BY METAL OXIDES, AND SURFACES OF OTHER SI02-COATED MATERIALS

 #152
20090166326
2009-07-02

Edge electrodes with dielectric covers

 #153
20090148624
2009-06-11

PLASMA CVD APPARATUS AND METHOD

 #154
20090120365
2009-05-14

Substrate processing apparatus

 #155
20090071405
2009-03-19

Substrate processing apparatus

 #156
20090011120
2009-01-08

Plasma Treating Apparatus, Electrode Member for Plasma Treating Apparatus, Electrode Member Manufacturing Method and Recycling Method

 #157
20090008245
2009-01-08

Method for connecting magnetic substance target to backing plate, and magnetic substance target

 #158
20080314321
2008-12-25

PLASMA PROCESSING APPARATUS

 #159
20080286980
2008-11-20

Substrate processing apparatus and semiconductor device producing method

 #160
20080236754
2008-10-02

Plasma processing apparatus

 #161
20080236752
2008-10-02

Plasma processing apparatus

 #162
20080202688
2008-08-28

Silicon carbide gas distribution plate and RF electrode for plasma etch chamber

 #163
20080196661
2008-08-21

PLASMA SPRAYED DEPOSITION RING ISOLATOR

 #164
20080184934
2008-08-07

Plasma reactor for the treatment of large size substrates

 #165
20080156266
2008-07-03

Plasma processing apparatus

 #166
20080105379
2008-05-08

Plasma processing apparatus

 #167
20080087382
2008-04-17

SUBSTRATE STAGE AND PLASMA PROCESSING APPARATUS

 #168
20080083979
2008-04-10

Wafer holder and semiconductor manufacturing apparatus equipped with wafer holder

 #169
20080023145
2008-01-31

Plasma processing apparatus and method

 #170
20070283888
2007-12-13

Plasma reactor for the treatment of large size substrates

 #171
20070170156
2007-07-26

Electrode for generating plasma and plasma processing apparatus using same

 #172
20070137573
2007-06-21

Apparatus for an optimized plasma chamber grounded electrode assembly

 #173
20070111030
2007-05-17

Corrosion resistant multilayer member

 #174
20070044716
2007-03-01

Plasma processing apparatus

 #175
20070012657
2007-01-18

Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof

 #176
20060183344
2006-08-17

Barrier layer for a processing element and a method of forming the same

 #177
20060137610
2006-06-29

Plasma processing apparatus with insulated gas inlet pore

 #178
20060096704
2006-05-11

Dry etching apparatus

 #179
20060091104
2006-05-04

Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing

 #180
20060032586
2006-02-16

Reducing electrostatic charge by roughening the susceptor

 #181
20050227118
2005-10-13

Plasma resistant member

 #182
20050211384
2005-09-29

Thermally sprayed member, electrode and plasma processing apparatus using the electrode

 #183
20050206290
2005-09-22

Method and apparatus for stabilizing of the glow plasma discharges

 #184
20050193951
2005-09-08

Plasma processing apparatus

 #185
20050045107
2005-03-03

Plasma processing apparatus, protecting layer therefor and installation of protecting layer

 #186
16537297
2023-03-21

Atmospheric-pressure plasma processing apparatus and method using argon plasma gas