205343 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Electrodes Triode systems
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER ON A SUBSTRATE, ESPECIALLY ON A SUBSTRATE COMPRISING INDENTATIONS IN THE SURFACE TO BE COATED
#2Symmetric VHF source for a plasma reactor
#3Symmetric VHF source for a plasma reactor
#4Process chamber for etching low k and other dielectric films
#5Process chamber for etching low K and other dielectric films
#6Symmetric VHF source for a plasma reactor
#7Process chamber for etching low K and other dielectric films
#8Method of producing plasma by multiple-phase alternating or pulsed electrical current
#9Symmetric VHF source for a plasma reactor
#10Process chamber for etching low k and other dielectric films
#11PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#12Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same
#13Plasma CVD device and method of manufacturing silicon thin film
#14Symmetric VHF source for a plasma reactor
#15METHOD AND APPARATUS FOR GENERATING PLASMA
#16Methods and arrangements for managing plasma confinement
#17Vacuum processing apparatus
#18MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#19Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same
#20Method and system for uniformity control in ballistic electron beam enhanced plasma processing system
#21Apparatus of triple-electrode dielectric barrier discharge at atmospheric pressure
#22PLASMA PROCESSING APPARATUS
#23Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
#24Plasma etch reactor and method