H01J37/32605 - CPC Classification Index

ClassID:

205345 ⎘

H01J37/32605 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Electrodes Removable or replaceable electrodes or electrode systems

Recent Application in this class:

20260074160

2026-03-12

SUBSTRATE PROCESSING DEVICE AND INNER CHAMBER ASSEMBLY

20240297025

2024-09-05

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS

20210305027

2021-09-30

Plasma processing apparatus and wear amount measurement method

20210151296

2021-05-20

Mode-switching plasma systems and methods of operating thereof

20210087671

2021-03-25

Processing System For Small Substrates

20210027991

2021-01-28

Mode-switching plasma systems and methods of operating thereof

20190172687

2019-06-06

Ring-shaped electrode

20190019657

2019-01-17

Atomic layer deposition apparatus

20170243727

2017-08-24

Atmospheric pressure pulsed arc plasma source and methods of coating therewith

#10

20170213753

2017-07-27

Controlling the RF amplitude of an edge ring of a capacitively coupled plasma process device

#11

20170194129

2017-07-06

Processing system for small substrates

#12

20170103876

2017-04-13

Plasma generator, annealing device, deposition crystallization apparatus and annealing process

#13

20160329256

2016-11-10

Methods and apparatus for controlling substrate uniformity

#14

20160307741

2016-10-20

Method for surface treatment of upper electrode, plasma processing apparatus and upper electrode

#15

20160184966

2016-06-30

Method of manufacturing an upper electrode of a plasma processing device

#16

20160024655

2016-01-28

Atmospheric lid with rigid plate for carousel processing chambers

#17

20150357166

2015-12-10

Method for attachment of an electrode into an inductively-coupled plasma

#18

20140167597

2014-06-19

Cathode interface for a plasma gun and method of making and using the same

#19

20140154888

2014-06-05

Showerhead electrode assemblies for plasma processing apparatuses

#20

20140087587

2014-03-27

High temperature electrode connections

#21

20140034242

2014-02-06

EDGE RING ASSEMBLY FOR PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF

#22

20130288483

2013-10-31

Methods and apparatus for controlling substrate uniformity

#23

20130280914

2013-10-24

Method of processing a semiconductor substrate in a plasma processing apparatus

#24

20130134855

2013-05-30

System for attachment of an electrode into a plasma source

#25

20130034967

2013-02-07

Gasket with positioning feature for clamped monolithic showerhead electrode

#26

20120258603

2012-10-11

Clamped monolithic showerhead electrode

#27

20120193449

2012-08-02

Anchoring inserts, electrode assemblies, and plasma processing chambers

#28

20120171872

2012-07-05

Clamped showerhead electrode assembly

#29

20120171871

2012-07-05

Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus

#30

20120160941

2012-06-28

Showerhead electrodes

#31

20120073752

2012-03-29

Adapter Ring For Silicon Electrode

#32

20120013242

2012-01-19

Backside mounted electrode carriers and assemblies incorporating the same

#33

20110162801

2011-07-07

Plasma processing apparatus

#34

20110155322

2011-06-30

Plasma processing apparatus

#35

20110095688

2011-04-28

Apparatus for producing plasma

#36

20100261354

2010-10-14

Gasket with positioning feature for clamped monolithic showerhead electrode

#37

20100184298

2010-07-22

Composite showerhead electrode assembly for a plasma processing apparatus

#38

20100038033

2010-02-18

Anchoring inserts, electrode assemblies, and plasma processing chambers

#39

20100021655

2010-01-28

PLASMA ELECTRODE

#40

20100003829

2010-01-07

Clamped monolithic showerhead electrode

#41

20100003824

2010-01-07

Clamped showerhead electrode assembly

#42

20090322199

2009-12-31

BACKSIDE MOUNTED ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME

#43

20090321018

2009-12-31

Peripherally engaging electrode carriers and assemblies incorporating the same

#44

20090305509

2009-12-10

Showerhead electrode assemblies for plasma processing apparatuses

#45

20090126633

2009-05-21

Electrode/probe assemblies and plasma processing chambers incorporating the same

#46

20090095424

2009-04-16

Showerhead electrode assemblies and plasma processing chambers incorporating the same

#47

20080088217

2008-04-17

PLASMA GENERATING DEVICE, METHOD OF CLEANING DISPLAY PANEL, AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME

#48

20070068455

2007-03-29

Width adjustable substrate support for plasma processing

#49

20060138081

2006-06-29

Methods for silicon electrode assembly etch rate and etch uniformity recovery

#50

20060108069

2006-05-25

Plasma reaction chamber and captive silicon electrode plate for processing semiconductor wafers

#51

20050279456

2005-12-22

Plasma reactor with high productivity

#52

20050098106

2005-05-12

Method and apparatus for improved electrode plate