205353 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Magnetic control means Electron cyclotron resonance
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#2Ru ETCHING INDUCED BY ELECTRON BEAM IRRADIATION AND REMOTE PLASMA
#3PLASMA PROCESSING METHOD
#4PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
#5WAFER PROCESSING APPARATUS
#6ELECTRON BEAM-INDUCED AND REMOTE PLASMA-ASSISTED SIMULTANEOUS MATERIAL-SELECTIVE ETCHING AND GROWTH
#7LOW PRESSURE PLASMA ETCH PROCESS FOR PREFERENTIAL GENERATION OF OXIDE RESIDUE AND APPLICATIONS FOR THE SAME
#8PLASMA PROCESSING APPARATUS
#9PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD
#10PLASMA PROCESSING APPARATUS
#11Plasma processing apparatus
#12PLASMA PROCESSING APPARATUS
#13Plasma processing apparatus
#14PLASMA ENHANCED ATOMIC LAYER DEPOSITION (PEALD) APPARATUS
#15Modular microwave source with local lorentz force
#16Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)
#17Multiple frequency electron cyclotron resonance thruster
#18ECR ion source and method for operating an ECR ion source
#19Plasma processing apparatus, plasma processing method, and ECR height monitor
#20Charge neutralizer and plasma generator
#21Resonant structure for electron cyclotron resonant (ECR) plasma ionization
#22Plasma processing apparatus and plasma processing method
#23Method for implanting single or multiply charged ions into a surface of a treated object and device for implementation of the method
#24Plasma processing apparatus
#25Cyclotronic plasma actuator with arc-magnet for active flow control
#26METHOD FOR IMPLANTING IONS ON A SURFACE OF AN OBJECT TO BE TREATED AND INSTALLATION FOR IMPLEMENTING THIS METHOD
#27PLASMA PROCESSING APPARATUS
#28Modular microwave source with local Lorentz force
#29Device for producing an amorphous carbon layer by electron cyclotron resonance plasma
#30Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
#31Cyclotronic plasma actuator with arc-magnet for active flow control
#32Plasma generation for ion implanter
#33Method of manufacturing a semiconductor device
#34PLACING UNIT AND PLASMA PROCESSING APPARATUS
#35PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
#36Method and device for generating a plasma excited by a microwave energy in the electron cyclotron resonance (ECR) domain, in order to carry out a surface treatment or produce a coating around a filiform element
#37Plasma processing apparatus with gas feed and evacuation conduit
#38RF current drive for plasma electric generation system
#39Apparatus and method for mass analyzed ion beam
#40Hybrid plasma source
#41Device for generating plasma having a high range along an axis by electron cyclotron resonance (ECR) from a gaseous medium
#42Facility for microwave treatment of a load
#43Plasma processing apparatus and plasma processing method
#44Electron cyclotron resonance ion source device
#45High density microwave plasma generation apparatus, and magnetron sputtering deposition system using the same
#46Microwave-excited plasma device
#47PLASMA GENERATION DEVICE WITH ELECTRON CYCLOTRON RESONANCE
#48Methods and apparatus for controlling photoresist line width roughness
#49Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination
#50MAGNETIC MODUE OF ELECTRON CYCLOTRON RESONANCE AND ELECTRON CYCLOTRON RESONANCE APPARATUS USING THE SAME
#51PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#52SPUTTERING SYSTEM
#53Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination
#54ECR-plasma source and methods for treatment of semiconductor structures
#55PLASMA PROCESSING APPARATUS
#56Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
#57Plasma generating apparatus
#58Device and method for producing and/or confining a plasma
#59Method and apparatus for forming a film by deposition from a plasma
#60Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance
#61FILM DEPOSITION OF AMORPHOUS FILMS BY ELECTRON CYCLOTRON RESONANCE
#62APPARATUS FOR GENERATING A PLASMA
#63Device for forming a film by deposition from a plasma
#64Deposition of amorphous silicon films by electron cyclotron resonance
#65Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma
#66Method of forming a film by deposition from a plasma
#67Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination
#68ECR PLASMA SOURCE
#69Plasma etching method and apparatus therefor
#70Plasma processing apparatus and a plasma processing method
#71Method for Generating a Cold Plasma for Sterilizing a Gaseous Medium and Device Therefor
#72SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS CAPABLE OF REDUCING PARTICLE CONTAMINATION
#73Producing method of semiconductor device
#74Sputter deposition method for forming integrated circuit
#75Method for etching and apparatus for etching
#76Plasma processing apparatus
#77Electron cyclotron resonance (ecr) plasma source having a linear plasma discharge opening
#78RF current drive for plasma electric generation system
#79Plasma etching method and apparatus therefor
#80PLASMA DEPOSITION APPARATUS AND METHOD
#81Plasma processing apparatus and a plasma processing method
#82Plasma processing apparatus and plasma processing method
#83Device for production of a plasma sheet
#84ECR-plasma source and methods for treatment of semiconductor structures
#85Microwave enhanced CVD method and apparatus
#86Electron cyclotron resonance equipment with variable flare angle of horn antenna
#87ECR plasma source and ECR plasma device
#88Process for the fabrication of oxide films
#89Plasma processing apparatus and method
#90Plasma processing apparatus
#91Elementary plasma source and plasma generation apparatus using the same