H01J37/32688 - CPC Classification Index

ClassID:

205354 ⎘

H01J37/32688 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Magnetic control means Multi-cusp fields

Recent Application in this class:

20250316448

2025-10-09

HETEROGEOUS NEGATIVE ION SOURCE BASED UPON HYDROGEN PLASMA

20240222088

2024-07-04

METHOD AND DEVICES FOR PLASMA TREATMENT

20210123130

2021-04-29

Method and apparatus for depositing a material

20210013015

2021-01-14

Plasma processing apparatus

20180374688

2018-12-27

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

20180174806

2018-06-21

Plasma processing apparatus

20160355946

2016-12-08

Radical generator and molecular beam epitaxy apparatus

20160289815

2016-10-06

Method and apparatus for depositing a material

20160233047

2016-08-11

PLASMA-BASED MATERIAL MODIFICATION WITH NEUTRAL BEAM

#10

20160071704

2016-03-10

Inductively coupled RF plasma source with magnetic confinement and Faraday shielding

#11

20150206715

2015-07-23

Plasma etching method and plasma etching apparatus

#12

20130320854

2013-12-05

Inductively coupled plasma flood gun using an immersed low inductance RF coil and multicusp magnetic arrangement

#13

20130220547

2013-08-29

Substrate processing apparatus

#14

20130081938

2013-04-04

MAGNETRON SPUTTERING APPARATUS AND METHOD

#15

20130015053

2013-01-17

INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND FARADAY SHIELDING

#16

20120085917

2012-04-12

Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement

#17

20110232846

2011-09-29

MAGNETIC FIELD GENERATOR FOR MAGNETRON PLASMA

#18

20110174221

2011-07-21

Surface processing apparatus

#19

20110115589

2011-05-19

Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor

#20

20100301008

2010-12-02

PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE

#21

20100155223

2010-06-24

Electromagnet array in a sputter reactor

#22

20090008033

2009-01-08

Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor

#23

20080113149

2008-05-15

Surface processing apparatus

#24

20070113980

2007-05-24

Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor

#25

20070108042

2007-05-17

Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor

#26

20070074968

2007-04-05

ICP source for iPVD for uniform plasma in combination high pressure deposition and low pressure etch process

#27

20060213865

2006-09-28

Method and device for plasma-etching organic material film

#28

20060177600

2006-08-10

Inductive plasma system with sidewall magnet

#29

20060081559

2006-04-20

Plasma processing apparatus and plasma processing method

#30

20050263390

2005-12-01

Multi-step process for forming a metal barrier in a sputter reactor

#31

20050263389

2005-12-01

Variable quadruple electromagnet array in plasma processing

#32

20050211383

2005-09-29

Magnetron plasma-use magnetic field generation device

#33

20050184670

2005-08-25

Device for confinement of a plasma within a volume

#34

20050082256

2005-04-21

Plasma etching method