Patents-Review.com
ClassID:

205365 ⎘

H01J37/32788 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Means for moving the material to be treated for extracting the material from the process chamber

Recent Application in this class:
#1
20260085417
2026-03-26

GAS-PHASE CHEMICAL REACTOR AND METHOD OF USING SAME

 #2
20250313947
2025-10-09

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

 #3
20250174424
2025-05-29

ION GENERATOR AND ION IMPLANTER

 #4
20250166998
2025-05-22

GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM

 #5
20240404802
2024-12-05

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

 #6
20240337012
2024-10-10

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

 #7
20240290586
2024-08-29

METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE THEREFOR

 #8
20240096604
2024-03-21

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

 #9
20240079199
2024-03-07

Ion generator and ion implanter

 #10
20240062998
2024-02-22

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

 #11
20230352279
2023-11-02

MULTI-STATION PROCESSING TOOLS WITH STATION-VARYING SUPPORT FEATURES FOR BACKSIDE PROCESSING

 #12
20230307217
2023-09-28

OPERATION METHOD OF ETCHING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #13
20230178419
2023-06-08

SCALED LINER LAYER FOR ISOLATION STRUCTURE

 #14
20230154772
2023-05-18

SLIDE AND PIVOT ASSEMBLIES FOR PROCESS MODULE BIAS ASSEMBLIES OF SUBSTRATE PROCESSING SYSTEMS

 #15
20230154731
2023-05-18

Method of processing substrate

 #16
20230053083
2023-02-16

PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD

 #17
20230015528
2023-01-19

SYSTEMS AND METHODS FOR DECOMPOSITION OF MOLECULES

 #18
20220389575
2022-12-08

VACUUM PROCESSING APPARATUS

 #19
20220384159
2022-12-01

Sputter deposition

 #20
20220301808
2022-09-22

Ion generator and ion implanter

 #21
20220252548
2022-08-11

Chamber component cleanliness measurement system

 #22
20220178025
2022-06-09

GAS-PHASE CHEMICAL REACTOR AND METHOD OF USING SAME

 #23
20220130648
2022-04-28

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSFERRING METHOD

 #24
20220081759
2022-03-17

Apparatus and method for manufacturing metal gate structures

 #25
20220076932
2022-03-10

PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD

 #26
20210407774
2021-12-30

Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium

 #27
20210391179
2021-12-16

Gas curtain for semiconductor manufacturing system

 #28
20210391155
2021-12-16

Apparatus and system including high angle extraction optics

 #29
20210358758
2021-11-18

Method for releasing sample and plasma processing apparatus using same

 #30
20210335585
2021-10-28

CONTINUOUS FLOW SYSTEM AND METHOD FOR COATING SUBSTRATES

 #31
20210305071
2021-09-30

Processing of workpieces using fluorocarbon plasma

 #32
20210265136
2021-08-26

METHOD AND APPARATUS FOR PROCESSING WAFERS

 #33
20210166960
2021-06-03

JIG, PROCESSING SYSTEM AND PROCESSING METHOD

 #34
20210151333
2021-05-20

Method for treating substrate and apparatus for treating substrate

 #35
20210090926
2021-03-25

Processing method of workpiece

 #36
20210090850
2021-03-25

Charged particle beam apparatus

 #37
20210057191
2021-02-25

Reactor system coupled to an energy emitter control circuit

 #38
20200303153
2020-09-24

Ion generator and ion implanter

 #39
20200219695
2020-07-09

Ion source device

 #40
20200194234
2020-06-18

VACUUM CHAMBER OPENING SYSTEM

 #41
20200161171
2020-05-21

SCALED LINER LAYER FOR ISOLATION STRUCTURE

 #42
20200135554
2020-04-30

Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask

 #43
20200135509
2020-04-30

Gas curtain for semiconductor manufacturing system

 #44
20200058511
2020-02-20

Method for releasing sample and plasma processing apparatus using same

 #45
20190376180
2019-12-12

Gas-phase chemical reactor and method of using same

 #46
20190214230
2019-07-11

Metal recess for semiconductor structures

 #47
20190214229
2019-07-11

Metal recess for semiconductor structures

 #48
20190211452
2019-07-11

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION EQUIPMENT

 #49
20190180985
2019-06-13

Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage

 #50
20180374680
2018-12-27

PLASMA PROCESSING APPARATUS

 #51
20180350573
2018-12-06

Inflatable seal for media cooling

 #52
20180197760
2018-07-12

Dual PVD Chamber And Hybrid PVD-CVD Chambers

 #53
20180108529
2018-04-19

Integrated direct dielectric and metal deposition

 #54
20170372876
2017-12-28

Manufacturing method of semiconductor device

 #55
20170352562
2017-12-07

DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME

 #56
20170306483
2017-10-26

Film forming method and film forming apparatus

 #57
20170213708
2017-07-27

Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants

 #58
20170198391
2017-07-13

SUBSTRATE PROCESSING APPARATUS

 #59
20170194157
2017-07-06

Method for releasing sample and plasma processing apparatus using same

 #60
20170067156
2017-03-09

Plasma excitation for spatial atomic layer deposition (ALD) reactors

 #61
20170053781
2017-02-23

Multi-Station Chamber Having Symmetric Grounding Plate

 #62
20160186308
2016-06-30

Method and system for galvanizing by plasma evaporation

 #63
20160052789
2016-02-25

TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES

 #64
20150364347
2015-12-17

Direct lift process apparatus

 #65
20150255258
2015-09-10

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROVIDED WITH SAME

 #66
20150200119
2015-07-16

LASER SCRIBING AND PLASMA ETCH FOR HIGH DIE BREAK STRENGTH AND CLEAN SIDEWALL

 #67
20150107516
2015-04-23

PLASMA TREATMENT APPARATUS AND SUBSTRATE TREATMENT SYSTEM

 #68
20140014038
2014-01-16

Plasma enhanced chemical vapor deposition apparatus and method for controlling the same

 #69
20130059447
2013-03-07

Method for reduction of voltage potential spike during dechucking

 #70
20130048217
2013-02-28

Electrostatic chuck and semiconductor/liquid crystal manufacturing equipment

 #71
20130014371
2013-01-17

Methods of dechucking and system thereof

 #72
20120094025
2012-04-19

Substrate Depositing System and Method

 #73
20120090991
2012-04-19

Magnetron sputtering apparatus

 #74
20110311339
2011-12-22

Substrate processing apparatus and method of manufacturing semiconductor device

 #75
20110120495
2011-05-26

Plasma processing method

 #76
20100272918
2010-10-28

Method and system for galvanizing by plasma evaporation

 #77
20100255196
2010-10-07

TREATMENT SYSTEM FOR FLAT SUBSTRATES

 #78
20100248490
2010-09-30

Method and apparatus for reduction of voltage potential spike during dechucking

 #79
20100236718
2010-09-23

Substrate processing apparatus

 #80
20100048001
2010-02-25

Plasma dicing apparatus and method of manufacturing semiconductor chips

 #81
20090214401
2009-08-27

Plasma processing method

 #82
20080216865
2008-09-11

Plasma Processing Method

 #83
20080138535
2008-06-12

Substrate damage prevention system and method

 #84
20050242061
2005-11-03

Self-cleaning method for plasma CVD apparatus

 #85
20050224181
2005-10-13

Method and apparatus for in-situ film stack processing

 #86
20050028933
2005-02-10

Device for treating objects by plasma deposition

 #87
16569161
2020-03-24

Plasma processing apparatus