Patents-Review.com
ClassID:

205383 ⎘

H01J37/32954 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Plasma diagnostics; Monitoring and controlling tubes by information coming from the object and/or discharge Electron temperature measurement

Recent Application in this class:
#1
20260074158
2026-03-12

VERTICAL PLASMA SOURCE

 #2
20250266251
2025-08-21

APPARATUS FOR FABRICATING DISPLAY PANEL

 #3
20250218723
2025-07-03

SUBSTRATE SUPPORT DEVICE AND METHOD OF PREVENTING OCCURRENCE OF ARCING

 #4
20250191899
2025-06-12

TEMPERATURE CONTROL SYSTEM AND PLASMA PROCESSING SYSTEM

 #5
20250079128
2025-03-06

PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS

 #6
20240377331
2024-11-14

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

 #7
20240290589
2024-08-29

Plasma Measuring Method and Plasma Processing Apparatus

 #8
20240047178
2024-02-08

HTCC antenna for generation of microplasma

 #9
20220338337
2022-10-20

Langmuir probe operating at fixed voltages

 #10
20220005739
2022-01-06

Plasma processing apparatus and control method

 #11
20210375594
2021-12-02

APPARATUS AND METHOD FOR TEMPERATURE CONTROL, AND PLASMA EQUIPMENT

 #12
20210296078
2021-09-23

Ion generation device and ion generation method

 #13
20210035788
2021-02-04

Plasma processing apparatus and control method

 #14
20200373135
2020-11-26

Etching method and etching processing apparatus

 #15
20200227243
2020-07-16

Methods for thermally calibrating reaction chambers

 #16
20190228950
2019-07-25

Methods and systems for controlling plasma performance

 #17
20180301387
2018-10-18

Plasma processing apparatus and control method

 #18
20180114681
2018-04-26

Process condition sensing device and method for plasma chamber

 #19
20180114680
2018-04-26

Methods for thermally calibrating reaction chambers

 #20
20160260616
2016-09-08

Silicon selective removal

 #21
20160198558
2016-07-07

Apparatus and method for determining the type, density and temperature of neutral radicals in plasma

 #22
20150020972
2015-01-22

PROCESS CONDITION SENSING DEVICE AND METHOD FOR PLASMA CHAMBER

 #23
20140367042
2014-12-18

SYSTEMS FOR AUTOMATICALLY CHARACTERIZING A PLASMA

 #24
20140253092
2014-09-11

Method and apparatus of diagnosing plasma in plasma space

 #25
20130065399
2013-03-14

PLASMA PROCESSING METHOD

 #26
20130013253
2013-01-10

System, method, and program for predicting processing shape by plasma process

 #27
20120084026
2012-04-05

Method and system for characterizing a plasma

 #28
20110174777
2011-07-21

Process condition sensing device and method for plasma chamber

 #29
20110001465
2011-01-06

Plasma measurement device, plasma system, and method for measuring plasma characteristics

 #30
20100279512
2010-11-04

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICONDUCTOR SUBSTRATE

 #31
20100131226
2010-05-27

Plasma electron temperature measuring method and device

 #32
20090322342
2009-12-31

Methods for automatically characterizing a plasma

 #33
20080236748
2008-10-02

PLASMA PROCESSING APPARATUS

 #34
20070095287
2007-05-03

Plasma producing method and apparatus as well as plasma processing apparatus

 #35
20060255260
2006-11-16

Method and apparatus for process monitoring and control

 #36
20050151544
2005-07-14

Sensor array for measuring plasma characteristics in plasma processing environments

 #37
20050034811
2005-02-17

Sensor array for measuring plasma characteristics in plasma processing environments