205412 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Operating strategies Thickness uniformity of coated layers or desired profile of target erosion
Anti-Stiction Process for Mems Device
#2SUBSTRATE PROCESSING APPARATUS
#3System and Method for Atomic Layer Etching with Uniformity Control Mechanisms
#4INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES
#5SPUTTERING APPARATUS
#6WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE
#7PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES
#8Sputtering apparatus
#9SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE
#10THIN FILM FORMING APPARATUS AND METHOD
#11SPUTTERING APPARATUS
#12EROSION RATE MONITORING FOR WAFER FABRICATION EQUIPMENT
#13Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition
#14Deposition system and method
#15ELECTROCHROMIC DEVICES
#16OVERHANG REDUCTION USING PULSED BIAS
#17Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#18Deposition method for tuning magnetic field distribution of deposition equipment
#19Semiconductor Analysis System
#20Sputtering apparatus
#21Deposition system and method
#22Movement systems for sputter coating of non-flat substrates
#23Anti-stiction process for MEMS device
#24System and method for detecting abnormality of thin-film deposition process
#25Profiled sputtering target and method of making the same
#26Film forming method, film forming apparatus, and program
#27Method and system for adjustable coating using magnetron sputtering systems
#28Magnetron sputtering source and coating system arrangement
#29Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices
#30Sputtering apparatus including gas distribution system
#31Device for depositing nanometric sized particles onto a substrate
#32Biasable flux optimizer / collimator for PVD sputter chamber
#33Sputtering target with backside cooling grooves
#34Electrochromic devices
#35System, method and support for coating eyeglass lenses
#36Device, method and use for the coating of lenses
#37Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
#38Anti-stiction process for MEMS device
#39Apparatus and methods for depositing variable interference filters
#40PVD REACTOR WITH MAGNETIC ROTATION MECHANISM
#41Biasable flux optimizer / collimator for PVD sputter chamber
#42METHODS AND APPARATUS FOR MAINTAINING LOW NON-UNIFORMITY OVER TARGET LIFE
#43Methods and apparatus for substrate edge uniformity
#44Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
#45Sputtering apparatus including gas distribution system
#46Film formation apparatus
#47Systems and methods for uniform target erosion magnetic assemblies
#48Anti-stiction process for MEMS device
#49Sputtering target with backside cooling grooves
#50Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#51Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
#52PROCESSING APPARATUS AND COLLIMATOR
#53Magnetron Sputtering Apparatus
#54Connector piece for a tubular target
#55APPLICATION OF DIODE BOX TO REDUCE CRAZING IN GLASS COATINGS
#56SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM
#57Sputtering target with backside cooling grooves
#58Laterally adjustable return path magnet assembly and methods
#59Device having two end blocks, an assembly and a sputter system comprising same, and a method of providing RF power to a target assembly using said device or assembly
#60Electrochromic devices
#61Dual power feed rotary sputtering cathode
#62RF sputtering apparatus and sputtering method
#63Sputter device with moving target
#64Film formation apparatus and film-formed workpiece manufacturing method
#65METHOD OF SPUTTER DEPOSITION OF A FILM ON AN ESSENTIALLY PLANE EXTENDED SURFACE OF A SUBSTRATE
#66Apparatus for sputtering and operation method thereof
#67Acoustic resonator structure with inclined C-axis piezoelectric bulk and crystalline seed layers
#68DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSITION AND ION-BEAM EROSION
#69Sputter System for Uniform Sputtering
#70METHOD OF COATING HIGH ASPECT RATIO FEATURES
#71Apparatus for depositing a layer on a substrate in a processing gas
#72Cover with a sensor system for a configurable measuring system for a configurable sputtering system
#73Sputter unit
#74Method and device for producing uniform films on moving substrates and films produced in this way
#75Sputtering apparatus including gas distribution system
#76Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor
#77Electrochromic devices
#78COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENE
#79Target age compensation method for performing stable reactive sputtering processes
#80Methods and apparatus for maintaining low non-uniformity over target life
#81Sputtering apparatus
#82Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devices
#83Cathode assembly, physical vapor deposition system, and method for physical vapor deposition
#84Drum sputtering device
#85Substrate processing apparatus
#86Sputtering device and sputtering method
#87Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device
#88Dual-target sputter deposition with controlled phase difference between target powers
#89Sputtering target with backside cooling grooves
#90INLINE DEPOSITION CONTROL APPARATUS AND METHOD OF INLINE DEPOSITION CONTROL
#91Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devices
#92Sputtering apparatus
#93Radio-frequency sputtering system with rotary target for fabricating solar cells
#94Apparatus for cylindrical magnetron sputtering
#95Magnetron source, magnetron sputtering apparatus and magnetron sputtering method
#96Apparatus for forming gas blocking layer and method thereof
#97MAGNET ARRAY FOR A PHYSICAL VAPOR DEPOSITION SYSTEM
#98Sputtering apparatus
#99GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
#100Magnet unit and magnetron sputtering apparatus
#101Magnet transportation system, sputtering apparatus including the same and sputtering method
#102Ring cathode for use in a magnetron sputtering device
#103Deposition system and methods having improved material utilization
#104Physical vapor deposition with heat diffuser
#105Cylindrical magnetron having a shunt
#106Sputtering system
#107Multilayer-film sputtering apparatus and method of forming multilayer film
#108SPUTTER DEPOSITION SYSTEM AND METHOD
#109High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches
#110Film forming apparatus and film forming method
#111Rotary magnet sputtering apparatus
#112GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
#113CONTROL OF EROSION PROFILE ON A DIELECTRIC RF SPUTTER TARGET
#114Method for ultra-uniform sputter deposition using simultaneous RF and DC power on target
#115DEPOSITION SYSTEM HAVING IMPROVED MATERIAL UTILIZATION
#116Method of Hard Coating a Blade
#117Magnetic shunts in tubular targets
#118Method and Apparatus for Producing Controlled Stresses and Stress Gradients in Sputtered Films
#119Sputtering apparatus
#120METHOD AND APPARATUS FOR MANUFACTURING A SUBSTRATE WITH A MAGNETRON SPUTTER COATING
#121Sputtering apparatus and film-forming processes
#122Encapsulated and water cooled electromagnet array
#123SPUTTER CHAMBER FOR COATING A SUBSTRATE
#124Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
#125Sputter target utilization
#126Method for the production of a substrate with a magnetron sputter coating and unit for the same
#127Sputtering device
#128PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE