205413 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Operating strategies Composition uniformity or desired gradient
Plasma Etching with Metal Sputtering
#2DEVICE AND METHOD FOR COATING SUBSTRATES HAVING PLANAR OR SHAPED SURFACES BY MEANS OF MAGNETRON SPUTTERING
#3Sputtering apparatus, film deposition method, and control device
#4Functionally graded material by in-situ gradient alloy sputter deposition management
#5Silver copper indium gallium selenide reactive sputtering method and apparatus, and photovoltaic cell containing same
#6Cover with a sensor system for a configurable measuring system for a configurable sputtering system
#7DEPOSITION OF SOLID STATE ELECTROLYTE ON ELECTRODE LAYERS IN ELECTROCHEMICAL DEVICES
#8Functionally graded material by in-situ gradient alloy sputter deposition management
#9Functionally graded material by in-situ gradient alloy sputter deposition management
#10Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor
#11Magnetron-sputtering coating system and method, and display substrate
#12Sputtering apparatus, film deposition method, and control device
#13METHOD FOR PRODUCING A DIELECTRIC AND/OR BARRIER LAYER OR MULTILAYER ON A SUBSTRATE, AND DEVICE FOR IMPLEMENTING SAID METHOD
#14METHOD FOR COATING A SUBSTRATE AND COATER
#15Method for producing a multilayer coating and device for carrying out said method
#16METHOD AND APPARATUS FOR THE MULTI-LAYER AND MULTI-COMPONENT COATING OF THIN FILMS ON SUBSTRATES, AND MULTI-LAYER AND MULTI-COMPONENT COATINGS
#17SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL
#18Apparatus and method for pretreating and coating bodies
#19Apparatus
#20Single-process-chamber deposition system
#21Method for producing a multilayer coating and device for carrying out said method
#22Apparatus