ClassID:

205575

H01J49/126 - CPC Classification

Classification description:

Particle spectrometers or separator tubes; Details; Ion sources; Ion guns using an arc discharge, e.g. of the duoplasmatron type Other arc discharge ion sources using an applied magnetic field

Recent Application in this class:
#1
20240087869
2024-03-14

Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

#2
20230091625
2023-03-23

Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

#3
20210327699
2021-10-21

Apparatus and method for thermal assisted desorption ionization systems

#4
20210305037
2021-09-30

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry

#5
20200303175
2020-09-24

Apparatus and method for thermal assisted desorption ionization systems

#6
20200258733
2020-08-13

Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

#7
20190385831
2019-12-19

Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry

#8
20190080894
2019-03-14

Apparatus and method for thermal assisted desorption ionization systems

#9
20180226240
2018-08-09

Apparatus and method for thermal assisted desorption ionization systems

#10
20170084440
2017-03-23

Apparatus and method for thermal assisted desorption ionization systems

#11
20160042931
2016-02-11

Apparatus and method for thermal assisted desorption ionization systems

#12
20140346348
2014-11-27

Apparatus and method for thermal assisted desorption ionization systems

#13
20120199735
2012-08-09

Apparatus and method for thermal assisted desorption ionization systems

#14
15637538
2018-07-31

Ion implantation system having beam angle control in drift and deceleration modes