215753 ⎘
Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium; Gases the active gas being polyatomic, i.e. containing more than one atom comprising an excimer or exciplex KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
ULTRAVIOLET LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#2Adaptable computing network with real time, intelligent, 4D spherical scalability, tech stack awareness, tech stack integration, automatic bi-directional communications channel switching and order equilibrium—for large enterprise, time sensitive event/transaction driven applications
#3Absorbing Optical Switch for High Fluence Laser Pulse
#4ULTRAVIOLET LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#5OPTICAL ISOLATOR, ULTRAVIOLET LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD
#6OPTICAL ISOLATOR, ULTRAVIOLET LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD
#7GLASS PROCESSING METHOD
#8Electrical pulse compression circuit
#9PREDICTIVE CONTROL OF A PULSED LIGHT BEAM
#10Capped blocking coating for laser optics
#11GAS CONTROL METHOD AND RELATED USES
#12CONTROL SYSTEM FOR A PLURALITY OF DEEP ULTRAVIOLET OPTICAL OSCILLATORS
#13Electrode for a discharge chamber
#14High voltage pulse generation device, gas laser apparatus, and electronic device manufacturing method
#15Copper electrode material
#16Laser gas regenerating apparatus and electronic device manufacturing method
#17Electrode for a discharge chamber
#18Online calibration for repetition rate dependent performance variables
#19Arrangement of expanding optical flows for efficient laser extraction
#20Line narrowing module
#21Laser apparatus
#22Narrowband laser apparatus and spectral linewidth measuring apparatus
#23Laser gas purifying system and laser system
#24Integration of direct compressor with primary laser source and fast compressor
#25Beam reverser module and optical power amplifier having such a beam reverser module
#26Online calibration for repetition rate dependent performance variables
#27Laser system
#28System and method for automatic gas optimization in a two-chamber gas discharge laser system
#29Gas mixture control in a gas discharge light source
#30Narrow band laser apparatus
#31Method and apparatus for rapid sterilization of a room
#32Gas mixture control in a gas discharge light source
#33Gas laser device and condenser
#34Excimer laser apparatus and excimer laser system
#35Compensation for a disturbance in an optical source
#36Method and apparatus for rapid sterilization of hazmat suits, surgical instruments and the like
#37Gas laser oscillator capable of controlling gas pressure and gas consumption amount
#38LASER DEVICE, AND METHOD OF CONTROLLING ACTUATOR
#39Method of controlling wavelength of laser beam and laser apparatus
#40Beam reverser module and optical power amplifier having such a beam reverser module
#41DIFFRACTION GRATING, LASER APPARATUS, AND MANUFACTURING METHOD FOR DIFFRACTION GRATING
#42Laser chamber and discharge excitation gas laser apparatus
#43Laser apparatus
#44Method of controlling laser apparatus and laser apparatus
#45Laser apparatus and method of controlling laser apparatus
#46Excimer laser apparatus and excimer laser system
#47Laser apparatus
#48Excimer laser apparatus and excimer laser system
#49Master oscillator system and laser apparatus
#50EXCIMER LASER DEVICE
#51Laser gas injection system
#52Excimer laser device
#53Anodes for fluorine gas discharge lasers
#54Bandwidth control device
#55Excimer laser and line narrowing module
#56Gas discharge laser light source beam delivery unit
#57Line narrowing module, light source of exposure apparatus comprising the same, and method of producing exposure light using line narrowing
#58Cathodes for fluorine gas discharge lasers
#59Timing control for two-chamber gas discharge laser system
#60Very narrow band, two chamber, high rep-rate gas discharge laser system
#61Gas laser device and exposure apparatus using the same
#62System and method for controlling wavelength of a laser beam
#63Very narrow band, two chamber, high rep-rate gas discharge laser system
#64High power diode utilizing secondary emission
#65Gas discharge MOPA laser spectral analysis module
#66Laser spectral engineering for lithographic process
#67Gas discharge MOPA laser spectral analysis module
#68Laser spectral engineering for lithographic process
#69Optical elements with protective undercoating
#70Timing control for two-chamber gas discharge laser system
#71Method for direct compression of laser pulses with large temporal ratios
#72Compensation for a disturbance in an optical source
#73System and method for automatic gas optimization in a two-chamber gas discharge laser system