ClassID:

215754

H01S3/2258 - CPC Classification

Classification description:

Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium; Gases the active gas being polyatomic, i.e. containing more than one atom comprising an excimer or exciplex F2, i.e. molecular fluoride is comprised for lasing around 157 nm

Recent Application in this class:
#1
20220311200
2022-09-29

Capped blocking coating for laser optics

#2
20220285902
2022-09-08

GAS CONTROL METHOD AND RELATED USES

#3
20210384027
2021-12-09

Electrode for a discharge chamber

#4
20200328074
2020-10-15

Electrode for a discharge chamber

#5
20190237928
2019-08-01

Laser gas regeneration system and laser system

#6
20190081451
2019-03-14

LASER UNIT AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM

#7
20180026414
2018-01-25

Laser unit and non-transitory computer-readable storage medium

#8
20170229832
2017-08-10

Gas mixture control in a gas discharge light source

#9
20170201057
2017-07-13

Gas mixture control in a gas discharge light source

#10
20160322772
2016-11-03

Excimer laser apparatus and excimer laser system

#11
20160308324
2016-10-20

Laser chamber

#12
20160248214
2016-08-25

Laser unit and non-transitory computer-readable storage medium

#13
20150188274
2015-07-02

Method of controlling laser apparatus and laser apparatus

#14
20150055672
2015-02-26

Discharge-pumped gas laser device

#15
20150003485
2015-01-01

Excimer laser apparatus and excimer laser system

#16
20140105238
2014-04-17

Discharge-pumped gas laser device

#17
20130100980
2013-04-25

Excimer laser apparatus and excimer laser system

#18
20120087386
2012-04-12

Laser system

#19
20120002687
2012-01-05

Laser system

#20
20110104675
2011-05-05

Methods and Compositions for Diagnosing Carcinomas

#21
20110102759
2011-05-05

Laser system

#22
20100108913
2010-05-06

Laser system

#23
20090296755
2009-12-03

Laser system

#24
20080225904
2008-09-18

Laser system

#25
20070160103
2007-07-12

Gas discharge laser light source beam delivery unit

#26
20070014326
2007-01-18

Line narrowed laser apparatus

#27
20060274809
2006-12-07

Cathodes for fluorine gas discharge lasers

#28
20060251135
2006-11-09

Timing control for two-chamber gas discharge laser system

#29
20060126697
2006-06-15

Very narrow band, two chamber, high rep-rate gas discharge laser system

#30
20060093009
2006-05-04

Gas laser device and exposure apparatus using the same

#31
20050271109
2005-12-08

Very narrow band, two chamber, high rep-rate gas discharge laser system

#32
20050238077
2005-10-27

Method and apparatus for controlling the output of a gas discharge MOPA laser system

#33
20050185690
2005-08-25

Method and apparatus for controlling the output of a gas discharge laser system

#34
20050174576
2005-08-11

Gas discharge MOPA laser spectral analysis module

#35
20050135451
2005-06-23

Method and apparatus for controlling the output of a gas discharge MOPA laser system

#36
20050105579
2005-05-19

Laser output light pulse stretcher

#37
20050068997
2005-03-31

Laser spectral engineering for lithographic process

#38
20050046856
2005-03-03

Gas discharge MOPA laser spectral analysis module

#39
20050041701
2005-02-24

Laser spectral engineering for lithographic process

#40
20050031004
2005-02-10

Excimer or molecular fluorine laser system with precision timing

#41
20050025882
2005-02-03

Optical elements with protective undercoating

#42
20050018739
2005-01-27

Timing control for two-chamber gas discharge laser system

#43
20050018735
2005-01-27

Low-pressure axial direction excitation type Flaser oscillator