ClassID:

215795

H01S5/0211 - CPC Classification

Classification description:

Semiconductor lasers; Structural details or components not essential to laser action; Substrates, e.g. growth, shape, material, removal or bonding; Substrates made of ternary or quaternary compounds

Sub-classes:
Recent Application in this class:
#1
20260155632
2026-06-04

RELAXED WURTZITE INGAN LAYERS

#2
20260005485
2026-01-01

RELAXED WURTZITE INGAN LAYERS

#3
20210091540
2021-03-25

Quantum cascade laser and method for manufacturing same

#4
20200067267
2020-02-27

Nitride light emitter

#5
20180174911
2018-06-21

RAMO4 monocrystalline substrate

#6
20170149210
2017-05-25

Method for preparing organic polymer thin film laser

#7
20170123153
2017-05-04

Integration of bonded optoelectronics, photonics waveguide and VLSI SOI

#8
20170123152
2017-05-04

Integration of bonded optoelectronics, photonics waveguide and VLSI SOI

#9
20170123151
2017-05-04

Integration of bonded optoelectronics, photonics waveguide and VLSI SOI

#10
20170123150
2017-05-04

Integration of bonded optoelectronics, photonics waveguide and VLSI SOI

#11
20150115299
2015-04-30

III-nitride light emitting device with a region including only ternary, quaternary, and/or quinary III-nitride layers

#12
20110103421
2011-05-05

Application-oriented nitride substrates for epitaxial growth of electronic and optoelectronic device structures

#13
20100109017
2010-05-06

GaN-BASED COMPOUND SEMICONDUCTOR DEVICE

#14
20090200545
2009-08-13

ZnO-based semiconductor device

#15
20090045393
2009-02-19

Nitride semiconductor device and method for manufacturing the same

#16
20080283866
2008-11-20

Nitride semiconductor light-emitting device

#17
20080001174
2008-01-03

III-V group nitride system semiconductor substrate

#18
20070023761
2007-02-01

Silicon carbon germanium (SiCGe) substrate for a group III nitride-based device

#19
20060237709
2006-10-26

GaN-based compound semiconductor device

#20
20060131590
2006-06-22

Nitride semiconductor light-emitting device and method for producing same

#21
20050232323
2005-10-20

Extended wavelength strained layer lasers having nitrogen disposed therein

#22
20050023544
2005-02-03

III-V group nitride system semiconductor substrate