ClassID:

216154

H01S5/3428 - CPC Classification

Classification description:

Semiconductor lasers; Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well lasers [SQW-lasers], multiple quantum well lasers [MQW-lasers] or graded index separate confinement heterostructure lasers [GRINSCH-lasers] layer orientation perpendicular to the substrate

Recent Application in this class:
#1
20250241089
2025-07-24

LASER DIODES, LEDS, AND SILICON INTEGRATED SENSORS ON PATTERNED SUBSTRATES

#2
20230187567
2023-06-15

Optoelectronic device comprising a semiconductor layer based on GeSn having a single-crystal portion with a direct band structure and an underlying barrier region

#3
20200036163
2020-01-30

Light emitting apparatus and projector

#4
20180254611
2018-09-06

Nanowire laser structure and fabrication method

#5
20160352076
2016-12-01

Semiconductor laser diode and method of fabricating the same

#6
20160126702
2016-05-05

Light-emitting assembly having a carrier

#7
20140301420
2014-10-09

Semiconductor laser

#8
20140219306
2014-08-07

Multicolor photonic crystal laser array

#9
20120273794
2012-11-01

SEMICONDUCTOR LIGHT EMITTING DEVICE, WAFER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE

#10
20120235117
2012-09-20

Light emitting element and method for manufacturing same

#11
20120001153
2012-01-05

Pulsed growth of catalyst-free growth of GaN nanowires and application in group III nitride semiconductor bulk material

#12
20110140072
2011-06-16

DEFECT-FREE GROUP III - NITRIDE NANOSTRUCTURES AND DEVICES USING PULSED AND NON-PULSED GROWTH TECHNIQUES

#13
20100276664
2010-11-04

Thin-walled structures

#14
20090245314
2009-10-01

Light-emitting device and manufacturing method of the same

#15
20090169828
2009-07-02

Pulsed growth of catalyst-free growth of GaN nanowires and application in group III nitride semiconductor bulk material

#16
20090129426
2009-05-21

Semiconductor system having a ring laser fabricated by epitaxial layer overgrowth

#17
20080036038
2008-02-14

Pulsed growth of catalyst-free growth of GaN nanowires and application in group III nitride semiconductor bulk material

#18
20070041419
2007-02-22

Semiconductor system having a ring laser fabricated by expitaxial layer overgrowth

#19
20070019697
2007-01-25

VCSEL system with transverse P/N junction

#20
20060098705
2006-05-11

Nano-VCSEL device and fabrication thereof using nano-colonnades

#21
20060097389
2006-05-11

Nanowire interconnection and nano-scale device applications