Patents-Review.com
ClassID:

241735 ⎘

Y10S430/127 - CPC Classification

Classification description:

Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making Spectral sensitizer containing

Recent Application in this class:
#1
20240253023
2024-08-01

PERFLUORINATED AMIDE SALTS AND THEIR USES AS IONIC CONDUCTING MATERIALS

 #2
20220049159
2022-02-17

Converter system

 #3
20200063031
2020-02-27

Converter system

 #4
20120296107
2012-11-22

Photoacid Generators for the Synthesis of Oligo-DNA in a Polymer Matrix

 #5
20110318692
2011-12-29

Photoactive compound and photosensitive resin composition containing the same

 #6
20110256486
2011-10-20

Photolithography focus improvement by reduction of autofocus radiation transmission into substrate

 #7
20110245110
2011-10-06

Photoacid generators for the synthesis of oligo-DNA in a polymer matrix

 #8
20100331218
2010-12-30

Photoacid generators for the synthesis of oligo-DNA in a polymer matrix

 #9
20100009289
2010-01-14

Resist sensitizer

 #10
20090317742
2009-12-24

Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device

 #11
20090233229
2009-09-17

Lithographic printing plate precursor and method of lithographic printing

 #12
20090220888
2009-09-03

Dyed photoresists and methods and articles of manufacture comprising same

 #13
20090208865
2009-08-20

PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIATION TRANSMISSION INTO SUBSTRATE

 #14
20090202944
2009-08-13

Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition

 #15
20090136872
2009-05-28

Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same

 #16
20090062149
2009-03-05

Photoacid generators for the synthesis of oligo-DNA in a polymer matrix

 #17
20090038834
2009-02-12

Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same

 #18
20090035452
2009-02-05

Photosensitive paste and manufacturing method of member for display panel

 #19
20090017399
2009-01-15

Imageable elements with low pH developer solubility

 #20
20080311511
2008-12-18

Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming

 #21
20080299488
2008-12-04

Negative-working imageable elements and methods of use

 #22
20080268372
2008-10-30

Lithographic printing plate precursor

 #23
20080213694
2008-09-04

Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method

 #24
20080187862
2008-08-07

Photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout

 #25
20080166669
2008-07-10

Photoresists for visible light imaging

 #26
20080026316
2008-01-31

Photoresist composition with antibacterial agent

 #27
20070269745
2007-11-22

Lithographic printing plate precursors with oligomeric or polymeric sensitizers

 #28
20070265366
2007-11-15

Photoacid generators for the synthesis of oligo-DNA in a polymer matrix

 #29
20070015080
2007-01-18

Photoresist composition for imaging thick films

 #30
20060251989
2006-11-09

Photoresists for visible light imaging

 #31
20060210819
2006-09-21

Polyimide composite coverlays and methods and compositions relating thereto

 #32
20060204892
2006-09-14

Dyed photoresists and methods and articles of manufacture comprising same

 #33
20060134550
2006-06-22

Light sensitive planographic printing plate precursor and its processing method

 #34
20060110679
2006-05-25

Low-temperature curable photosensitive compositions

 #35
20060110678
2006-05-25

Low-temperature curable photosensitive compositions

 #36
20060078821
2006-04-13

Positive-tone radiation-sensitive resin composition

 #37
20060051701
2006-03-09

Polymerizable composition and planographic printing plate precursor

 #38
20060024614
2006-02-02

Photopolymerizable composition

 #39
20050282084
2005-12-22

Imaging compositions and methods

 #40
20050266345
2005-12-01

Imaging compositions and methods

 #41
20050260524
2005-11-24

Planographic printing plate material and preparing process of planographic printing plate

 #42
20050244747
2005-11-03

Positive-tone radiation-sensitive resin composition

 #43
20050175931
2005-08-11

Imaging compositions and methods

 #44
20050175929
2005-08-11

Imaging composition and method

 #45
20050164120
2005-07-28

Photopolymerizable composition

 #46
20050153231
2005-07-14

Thiol compound, photopolymerization initiator composition and photosensitive composition

 #47
20050123831
2005-06-09

Pentacyclic anion salts or tetrazapentalene derivatives and their uses as ionic conducting materials

 #48
20050112382
2005-05-26

Molecular photoresists containing nonpolymeric silsesquioxanes

 #49
20050095533
2005-05-05

Nitrogen-containing organic compound, resist composition and patterning process

 #50
20050074668
2005-04-07

Perfluorinated amide salts and their uses as ionic conducting materials

 #51
20050064341
2005-03-24

Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method