241736 ⎘
Radiation imagery chemistry: process, composition, or product thereof; Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing; Radiation sensitive composition or product or process of making Radiation-activated cross-linking agent containing
Negative resist composition and patterning process
#2Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
#3Chemically amplified resist composition and patterning process
#4Hybrid photoresist composition and pattern forming method using thereof
#5Compound, photosensitive composition comprising the same and photosensitive material
#6Developable bottom antireflective coating composition and pattern forming method using thereof
#7Radiation-sensitive composition, and compound
#8Pattern forming method, chemical amplification resist composition and resist film
#9Film, method for manufacturing the film and masking method using the film
#10Hybrid photoresist composition and pattern forming method using thereof
#11Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
#12Pattern forming method, pattern, chemical amplification resist composition and resist film
#13Patterning process and photoresist with a photodegradable base
#14Resist composition and patterning process
#15Resist composition and patterning process
#16Patterning process and chemical amplified photoresist with a photodegradable base
#17Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
#18Method for forming resist pattern and method for manufacturing a semiconductor device
#19Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device
#20Method of forming resist pattern
#21Resist composition and method for forming a pattern using the same
#22Method for forming pattern, and material for forming coating film
#23Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing
#24Resist composition and patterning process
#25Photosensitive hardmask for microlithography
#26Si device making method by using a novel material for packing and unpacking process
#27Material for forming resist protective film and method for forming resist pattern using same
#28Methods of forming a pattern of a semiconductor device
#29Polymer compound, negative resist composition, and method of forming resist pattern
#30Method for air gap formation using UV-decomposable materials
#31Method for forming resist pattern and method for manufacturing a semiconductor device
#32Photoresist composition and method of forming a photoresist pattern using the same
#33Amine-arresting additives for materials used in photolithographic processes
#34Underlayer coating forming composition for lithography containing polysilane compound
#35Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
#36Chemically amplified photoresist composition, laminated product, and connection element
#37Photoresist formulation for high aspect ratio plating
#38Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
#39Positive-type photosensitive resin composition and cured film manufactured therefrom
#40Plastic materials including dendrimers or hyperbranched polymers for integrated circuit packaging
#41Organic anti-reflective coating composition and method for forming photoresist patterns using the same
#42Photoresist formulation for high aspect ratio plating
#43Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
#44Acrylic polymer-containing gap fill material forming composition for lithography
#45Planographic printing plate precursor
#46Photoresist composition and method of forming a pattern using the same
#47Thermally cured undercoat for lithographic application
#48Methods for photopatterning hydrogels
#49Negative photoresist composition including non-crosslinking chemistry
#50Polymerizable composition and image recording material containing the same
#51Negative resist composition with fluorosulfonamide-containing polymer
#52Recording medium