241751 ⎘
Radiation imagery chemistry: process, composition, or product thereof Electron beam
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#2Dual exposure patterning of a photomask to print a contact, a via or curvilinear shape on an integrated circuit
#3Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#4Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#5Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#6Method and system for forming patterns with charged particle beam lithography
#7Pre-patterned hard mask for ultrafast lithographic imaging
#8Endpoint detection for photolithography mask repair
#9Method for forming circular patterns on a surface
#10Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#11Electron beam data storage system and method for high volume manufacturing
#12Pre-patterned hard mask for ultrafast lithographic imaging
#13Method and system for forming a diagonal pattern using charged particle beam lithography
#14Resist composition, method of forming resist pattern, polymeric compound and compound
#15Endpoint detection for photolithography mask repair
#16Method and system for forming patterns with charged particle beam lithography
#17Negative resist composition and pattern forming method using the same
#18Multi charged particle beam writing apparatus and multi charged particle beam writing method
#19Exposure apparatus for forming a reticle
#20Lithography mask repairing process
#21Multi charged particle beam writing apparatus
#22Device for manufacturing a surface using character projection lithography with variable magnification
#23Developer and patterning process
#24Method for forming circular patterns on a surface
#25Smart subfield method for E-beam lithography
#26Resist protective film-forming composition and patterning process
#27Scanning transmission electron microscopy for imaging extended areas
#28Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
#29Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks
#30Data process for E-beam lithography
#31Multiple-grid exposure method
#32Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#33Electron beam lithography system and method for improving throughput
#34Electron beam lithography system and method for improving throughput
#35Smart subfield method for E-beam lithography
#36Devices and methods for improved reflective electron beam lithography
#37Electron beam data storage system and method for high volume manufacturing
#38Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#39Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#40Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#41Multiple-grid exposure method
#42Large-mesh cell-projection electron-beam lithography method
#43Multi charged particle beam writing apparatus and multi charged particle beam writing method
#44Scanning transmission electron microscopy
#45Reflective mask blank, method of manufacturing the same, and reflective mask
#46Resist developer, method for forming a resist pattern and method for manufacturing a mold
#47Charged particle beam drawing method and charged particle beam drawing apparatus
#48Exposure apparatus for forming a reticle and method of forming a reticle using the same
#49APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING
#50Method and system for charged particle beam lithography
#51Method of determining focus and dose of an apparatus of optical micro-lithography
#52Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#53Method and system for forming patterns with charged particle beam lithography
#54Charged particle beam writing apparatus
#55Method and system for fracturing a pattern using lithography with multiple exposure passes
#56Electron beam lithography system and method for improving throughput
#57Electron beam data storage system and method for high volume manufacturing
#58Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
#59METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#60Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
#61Method for fabricating a mask
#62Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#63Method for design and manufacture of diagonal patterns with variable shaped beam lithography
#64Method, device, and system for forming circular patterns on a surface
#65Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
#66Apparatus and method for conformal mask manufacturing
#67Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#68Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
#69Semiconductor lithography process
#70System and method for self-aligned dual patterning
#71Self-contained proximity effect correction inspiration for advanced lithography (special)
#72Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#73Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
#74Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
#75Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#76Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
#77Method for improving sensitivity of resist
#78Mixed lithography with dual resist and a single pattern transfer
#79Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
#80Semiconductor device with mushroom electrode and manufacture method thereof
#81Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
#82Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#83Method and system for manufacturing a surface using character projection lithography with variable magnification
#84Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
#85Exposure method using charged particle beam
#86Functionalized fullerenes for nanolithography applications
#87Pattern forming method
#88Information recording method and information recording apparatus
#89Method for forming resist pattern and method for manufacturing a semiconductor device
#90Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
#91Semiconductor device with mushroom electrode and manufacture method thereof
#92Method of mask forming and method of three-dimensional microfabrication
#93Method for maskless particle-beam exposure
#94Constant current multi-beam patterning
#95System and method for self-aligned dual patterning
#96Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
#97Method of manufacturing mask blank and transfer mask
#98Stencil, stencil design system and method for cell projection particle beam lithography
#99Method and system for design of a reticle to be manufactured using character projection lithography
#100Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#101Method and system for manufacturing a reticle using character projection lithography
#102Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
#103Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
#104Method and system for forming circular patterns on a surface
#105Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
#106Method for design and manufacture of a reticle using variable shaped beam lithography
#107Method for fracturing circular patterns and for manufacturing a semiconductor device
#108Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
#109Method and system for manufacturing a reticle using character projection particle beam lithography
#110Apparatus for aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
#111Method of synthesizing ITO electron-beam resist and method of forming ITO pattern using the same
#112Resist sensitizer
#113Beam ablation lithography
#114Fused aromatic structures and methods for photolithographic applications
#115Method for fabricating mold core
#116Sulfonium salt-containing polymer, resist composition, and patterning process
#117Polymer, polymer preparation method, resist composition and patterning process
#118Electron beam writing method for magnetic recording medium
#119Resist composition, resist protective coating composition, and patterning process
#120Positive resist composition and patterning process
#121Focus measurement method and method of manufacturing a semiconductor device
#122Positive resist compositions and patterning process
#123Exposure data preparation method and exposure method
#124Image enhancement for multiple exposure beams
#125High-resolution, patterned-media master mask
#126Method for transferring a predetermined pattern reducing proximity effects
#127Semiconductor device, method for manufacturing semiconductor device, and computer readable medium
#128Semiconductor device fabrication method and fabrication apparatus using a stencil mask
#129Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
#130Methods of manufacturing mask blank and transfer mask
#131Mixed lithography with dual resist and a single pattern transfer
#132FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
#133Functionalized carbosilane polymers and photoresist compositions containing the same
#134Method for forming resist pattern and method for manufacturing a semiconductor device
#135Resist composition and patterning process
#136Method of manufacturing mask
#137Multi-tone resist compositions
#138Positive-type resist composition
#139Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same
#140Method for translating a structured beam of energetic particles across a substrate in template mask lithography
#141Method for determining suitability of a resist in semiconductor wafer fabrication
#142Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
#143Fused aromatic structures and methods for photolithographic applications
#144Space tolerance with stitching
#145Method for making a relief printing form
#146Stencil mask having main and auxiliary strut and method of forming the same
#147Negative resist composition
#148NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
#149Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
#150Method to print photoresist lines with negative sidewalls
#151Method and system for improvement of dose correction for particle beam writers
#152Method and apparatus for measuring pattern dimensions
#153Method of pattern delineation
#154Composite photoresist structure
#155Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
#156Resist composition for electron beam or EUV
#157Apparatus and method for conformal mask manufacturing
#158Method of data encoding, compression, and transmission enabling maskless lithography
#159Dual layer workpiece masking and manufacturing process
#160Method and system for proximity effect and dose correction for a particle beam writing device
#161Semiconductor device with mushroom electrode and manufacture method thereof
#162System and method for charged-particle beam lithography
#163Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
#164Resist composition and patterning process
#165Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition
#166Method for electron beam proximity effect correction
#167Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
#168Methods of improving single layer resist patterning scheme
#169Electron beam lithography apparatus and method for compensating for electron beam misalignment
#170Method for fabricating semiconductor device and equipment for fabricating the same
#171Silsesquioxane resin
#172Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
#173Method of forming a mask layout and layout formed by the same
#174Parallel electron beam lithography stamp (PEBLS)
#175Pattern writing and forming method
#176Reference wafer calibration reticle
#177Methods of forming patterns in semiconductor devices using photo resist patterns
#178Information recording method and information recording apparatus
#179Methods for forming pattern using electron beam and cell masks used in electron beam lithography
#180Semiconductor device with mushroom electrode and manufacture method thereof
#181Method of fabricating nanoimprint mold
#182Method for determining an exposure dose and exposure apparatus
#183Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#184Antireflective hardmask and uses thereof
#185Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a pattern
#186Dual layer workpiece masking and manufacturing process
#187Electron beam lithography system
#188Writing a circuit design pattern with shaped particle beam flashes
#189Placement effects correction in raster pattern generator
#190Critical dimension effects correction in raster pattern generator
#191Resist composition for electron beam or EUV
#192Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
#193Reference wafer and process for manufacturing same
#194Exposure system, exposure method and semiconductor device manufacturing method
#195Method of registering a blank substrate to a pattern generating particle beam apparatus and of correcting alignment during pattern generation
#196Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product
#197Method to print photoresist lines with negative sidewalls
#198Parameter extracting method
#199Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
#200Method of fabricating a semiconductor device
#201Method for producing resist substrates
#202Method of patterning conductive polymer layer, organic light emitting device, and method of manufacturing the organic light emitting device
#203Micromachining process, system and product
#204Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates
#205Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
#206Electron beam duplication lithography method
#207Appartus and method for forming pattern
#208Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process
#209Electron beam lithography method using new material
#210Complementary masks and method of fabrication of same, exposure method, and semiconductor device and method of production of same
#211Resist and method of forming resist pattern
#212Methods and apparatus for selective, oxidative patterning of a surface
#213Apparatus for characterization of photoresist resolution, and method of use
#214Method of reducing the average process bias during production of a reticle
#215Method for fabricating optical devices in photonic crystal structures
#216Nanocomposite negative resists for next generation lithographies
#217Mechanically robust interconnect for low-k dielectric material using post treatment
#218Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
#219Apparatus and method for forming pattern
#220Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media
#221Electron beam lithography method
#222Method for reducing the fogging effect
#223Process for controlling the proximity effect correction
#224Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
#225Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof
#226Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
#227Method of making information storage devices by molecular photolithography
#228Photoacid generators based on novel superacids
#229Electron beam writing method and lithography mask manufacturing method
#230Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#231Method of increasing the shelf life of a photomask substrate
#232Method of exposing using electron beam
#233Image enhancement for multiple exposure beams
#234Semiconductor device fabrication method and fabrication apparatus using a stencil mask
#235Apparatus for characterization of photoresist resolution, and method of use
#236Electron exposure to reduce line edge roughness
#237Photoresist composition
#238Method and data-processing system for rule-based optical proximity correction with simulataneous scatter bar insertion
#239Electron beam duplication lithography method and apparatus
#240Photoresist composition for EUV and method for forming photoresist pattern using the same
#241Method for reducing an overlay error and measurement mark for carrying out the same
#242Method to print photoresist lines with negative sidewalls
#243MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
#244Antireflective hardmask and uses thereof
#245Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method
#246Method of monitoring an exposure process
#247Multiple exposure method for forming a patterned photoresist layer
#248Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device
#249Multipole lens, charged-particle beam instrument fitted with multipole lenses, and method of fabricating multipole lens
#250Method of generating mask distortion data, exposure method and method of producing semiconductor device
#251Mask for charged particle beam exposure, and method of forming the same
#252Defect inspection of extreme ultraviolet lithography masks and the like
#253Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
#254Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp