Y10S430/162 - CPC Classification Index

#1

20190086819

2019-03-21

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

#2

20170160650

2017-06-08

Lithographic apparatus and device manufacturing method

#3

20140347642

2014-11-27

Lithographic apparatus and device manufacturing method

#4

20140071420

2014-03-13

Lithographic apparatus and device manufacturing method

#5

20120280216

2012-11-08

Patterning

#6

20120013868

2012-01-19

Lithographic apparatus and device manufacturing method

#7

20110275746

2011-11-10

Pattern Hardening Coating Agent

#8

20110039214

2011-02-17

Pattern Forming Method and Method of Manufacturing Semiconductor Device

#9

20100099036

2010-04-22

Pattern forming method and method of manufacturing semiconductor device

#10

20100025715

2010-02-04

Ultra dark polymer

#11

20090123881

2009-05-14

Photothermographic material and image formation method

#12

20080193883

2008-08-14

Barrier film material and pattern formation method using the same

#13

20080193880

2008-08-14

Water soluble resin composition and method for pattern formation using the same

#14

20080166665

2008-07-10

Method for forming a fine pattern in a semicondutor device

#15

20080057447

2008-03-06

Image forming method

#16

20070287102

2007-12-13

Pattern formation method

#17

20070207415

2007-09-06

Process for producing wiring circuit board

#18

20070201012

2007-08-30

Lithographic apparatus and device manufacturing method

#19

20070196774

2007-08-23

Exposure method and device manufacturing method

#20

20070190462

2007-08-16

Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device

#21

20070178416

2007-08-02

Photothermographic material

#22

20070154822

2007-07-05

Imaging element having improved durability

#23

20070141516

2007-06-21

Ultra dark polymer

#24

20070128543

2007-06-07

Topcoats for use in immersion lithography

#25

20060275707

2006-12-07

Pattern formation method

#26

20060275706

2006-12-07

Immersion lithography contamination gettering layer

#27

20060275704

2006-12-07

Topcoats for use in immersion lithography

#28

20060263726

2006-11-23

Pattern forming method and method of manufacturing semiconductor device

#29

20060210931

2006-09-21

Thermally developable materials with narrow disperse amorphous silica

#30

20060177777

2006-08-10

Pattern forming method and method of manufacturing semiconductor device

#31

20060127812

2006-06-15

Barrier film material and pattern formation method using the same

#32

20060127804

2006-06-15

Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device

#33

20060111550

2006-05-25

Top coating composition for photoresist and method of forming photoresist pattern using same

#34

20060051713

2006-03-09

Thermally developable materials containing cationic overcoat polymer

#35

20060051712

2006-03-09

Thermally developable materials containing ionic polymer interlayer

#36

20060025305

2006-02-02

Thermally transferable image protective sheet, method for protective layer formation, and record produced by said method

#37

20060019203

2006-01-26

Method of manufacturing a photothermographic material by aqueous coating and a photothermographic material prepared therewith

#38

20050244721

2005-11-03

Composite layer method for minimizing PED effect

#39

20050192179

2005-09-01

Protective overcoat and process for thermal dye sublimation prints

#40

20050175940

2005-08-11

Device manufacturing method and a substrate

#41

20050095540

2005-05-05

Thermally developable imaging materials with barrier layer

#42

20050094119

2005-05-05

Lithographic apparatus and device manufacturing method

#43

20050094116

2005-05-05

Gradient immersion lithography

#44

20050084810

2005-04-21

Highly lubricated imaging element with elastomeric matte

#45

20050084809

2005-04-21

Thermally development imaging materials having backside stabilizers

#46

20050084808

2005-04-21

Thermally developable imaging materials having backside stabilizers

#47

20050064320

2005-03-24

Method of transferring a protective overcoat to a dye-donor element

#48

20050064319

2005-03-24

Process of transferring transferable protection overcoat to a dye-donor element

#49

20050053868

2005-03-10

Process for producing wiring circuit board

#50

20050031982

2005-02-10

Imaging material with improved scratch resistance

#51

20050014094

2005-01-20

Organic anti-reflective coating composition and pattern forming method using the same