Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Industrial X-ray photosensitive material

Near-field exposure apparatus and near-field exposure method

Sulfonium salt-containing polymer, resist composition, and patterning process

Positive-type resist composition

Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same

Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same

Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition

Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition

Photothermographic material

Blocked aliphatic thiol stabilizers for photothermographic materials

Resist and method of forming resist pattern

Nanocomposite negative resists for next generation lithographies

Photothermographic materials containing silver halide sensitized with combination of compounds

Photothermographic materials with opaque crossover control means

Photothermographic material and image forming method

Photothermographic material

Method of making information storage devices by molecular photolithography

Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same

Polymer compound, resist material and pattern formation method

Photothermographic materials containing silver halide sensitized with combination of compounds

Phosphor screen and imaging assembly with poly(lactic acid) support

Photoresist composition for EUV and method for forming photoresist pattern using the same

Ultrahigh speed imaging assembly for radiography

High speed imaging assembly for radiography

High-speed radiographic film

High speed radiographic imaging assembly

Phosphor screen and imaging assembly

Image forming method using photothermographic material

MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS

Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device

Defect inspection of extreme ultraviolet lithography masks and the like

Drug development and manufacturing