Ryoichi Ishihara

City:

Delft

Country:

Netherlands

Published Applications:

Last publication date:

2025-03-13

Top Assignees for applications by Ryoichi Ishihara

The entities that hold a legal rights for patent applications filed by inventor Ishihara Ryoichi:

Ryoichi Ishihara from Delft, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

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Low-Temperature Formation Of Thin-Film Structures

Method of forming silicon on a substrate

Manufacturing a submicron structure using a liquid precursor

Method of manufacturing part of a thin-film device using an ink comprising a material precursor

InventorID:

1006941 ⎘