Inventor profile of:

Patrick A. Van Cleemput

City:

San Jose, California

Country:

United States

Published Applications:

20

Last publication date:

2022-06-23

Top Assignees for applications by Patrick A. Van Cleemput

The entities that hold a legal rights for patent applications filed by inventor Van Cleemput Patrick A.:

Recent patent applications by Van Cleemput Patrick A.

Patrick A. Van Cleemput from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2022-06-23
US20220195598A1
Chemistry; metallurgy

Atomic layer deposition of metal films

#2 | 2022-01-13
US20220013365A1
Electricity

Deposition of tungsten on molybdenum templates

#3 | 2021-11-04
US20210343579A1
Electricity

Method to create air gaps

#4 | 2021-08-05
US20210242019A1
Electricity

Tin oxide thin film spacers in semiconductor device manufacturing

#5 | 2021-05-13
US20210140043A1
Chemistry; metallurgy

DEPOSITION OF PURE METAL FILMS

#6 | 2018-10-11
US20180294187A1
Electricity

Low resistivity films containing molybdenum

#7 | 2018-08-16
US20180233398A1
Electricity

Method to create air gaps

#8 | 2018-05-31
US20180151503A1
Electricity

Interlevel conductor pre-fill utilizing selective barrier deposition

#9 | 2018-04-19
US20180108529A1
Electricity

Integrated direct dielectric and metal deposition

#10 | 2018-01-11
US20180012759A1
Electricity

Tin oxide thin film spacers in semiconductor device manufacturing

#11 | 2018-01-04
US20180005801A1
Electricity

Apparatus and method for deposition and etch in gap fill

#12 | 2017-11-21
US15195348
Electricity

Tin oxide thin film spacers in semiconductor device manufacturing

#13 | 2017-09-26
US15199608
Electricity

Apparatus and method for deposition and etch in gap fill

#14 | 2017-06-08
US20170162512A1
Electricity

Interlevel conductor pre-fill utilizing selective barrier deposition

#15 | 2017-05-18
US20170140931A1
Electricity

Low k dielectric deposition via UV driven photopolymerization

#16 | 2017-05-18
US20170137943A1
Chemistry; metallurgy

Apparatus for UV flowable dielectric

#17 | 2016-11-10
US20160329213A1
Electricity

HIGHLY SELECTIVE DEPOSITION OF AMORPHOUS CARBON AS A METAL DIFFUSION BARRIER LAYER

#18 | 2016-04-28
US20160118296A1
Electricity

Interlevel conductor pre-fill utilizing selective barrier deposition

#19 | 2016-02-25
US20160056071A1
Electricity

Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor

#20 | 2015-01-01
US20150004806A1
Electricity

Low-K oxide deposition by hydrolysis and condensation

InventorID:

1022802 ⎘