Mark J. Wihl

City:

Tracy, California

Country:

United States

Published Applications:

Last publication date:

2017-02-23

Top Assignees for applications by Mark J. Wihl

The entities that hold a legal rights for patent applications filed by inventor Wihl Mark J.:

Mark J. Wihl from Tracy, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Monitoring changes in photomask defectivity

Monitoring changes in photomask defectivity

Method for detecting lithographically significant defects on reticles

Multiple design database layer inspection

InventorID:

1049722 ⎘