Niigata
Japan
21
2015-01-29
The entities that hold a legal rights for patent applications filed by inventor HATAKEYAMA Jun:
Jun HATAKEYAMA from Niigata, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Resist top coat composition and patterning process
#2 | 2010-06-17Bottom resist layer composition and patterning process using the same
#3 | 2009-08-13Positive resist composition and patterning process using the same
#4 | 2009-08-13Positive resist composition and patterning process using the same
#5 | 2009-08-06Resist top coat composition and patterning process
#6 | 2008-09-18Resist lower layer film-formed substrate
#7 | 2008-09-11Antireflection film composition and patterning process using the same
#8 | 2008-02-14Bottom resist layer composition and patterning process using the same
#9 | 2008-01-24Negative resist composition and patterning process using the same
#10 | 2008-01-24Novel polymer, positive resist composition and patterning process using the same
#11 | 2007-12-27Resist top coat composition and patterning process
#12 | 2007-11-29Resist protective film composition and patterning process
#13 | 2007-10-04Resist composition and patterning process using the same
#14 | 2007-08-09Polymerizable compound, polymer, positive-resist composition, and patterning process using the same
#15 | 2007-05-17Resist composition and patterning process using the same
#16 | 2007-05-08Resist lower layer film material and method for forming a pattern
#17 | 2007-01-16Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
#18 | 2006-10-19Bottom resist layer composition and patterning process using the same
#19 | 2006-07-06Resist composition and patterning process using the same
#20 | 2005-04-14Polymerizable compound, polymer, positive-resist composition, and patterning process using the same
#21 | 2005-04-14Polymer, positive resist composition, and patterning process using the same
1051395 ⎘