Dresden
Germany
30
2020-08-06
The entities that hold a legal rights for patent applications filed by inventor Smith Elliot John:
Elliot John Smith from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Semiconductor device with interconnect to source/drain
#2 | 2019-11-19Front-end-of-line device structure and method of forming such a front-end-of-line device structure
#3 | 2019-10-17High-voltage transistor device with thick gate insulation layers
#4 | 2019-10-10Semiconductor devices having silicon/germanium active regions with different germanium concentrations
#5 | 2019-10-10Semiconductor devices including Si/Ge active regions with different Ge concentrations
#6 | 2019-10-10SEMICONDUCTOR DEVICE INCLUDING FDSOI TRANSISTORS WITH COMPACT GROUND CONNECTION VIA BACK GATE
#7 | 2019-08-27Semiconductor devices including self-aligned active regions for planar transistor architecture
#8 | 2019-08-15Semiconductor device with interconnect to source/drain
#9 | 2019-05-16Technique and related semiconductor devices based on crystalline semiconductor material formed on the basis of deposited amorphous semiconductor material
#10 | 2019-05-02Early gate silicidation in transistor elements
#11 | 2019-02-07Technique for defining active regions of semiconductor devices with reduced lithography effort
#12 | 2019-01-31High-voltage transistor device with thick gate insulation layers
#13 | 2019-01-17High voltage transistor using buried insulating layer as gate dielectric
#14 | 2019-01-08SOI-based floating gate memory cell
#15 | 2018-06-21Gate structure with dual width electrode layer
#16 | 2018-04-05Method of forming a semiconductor device structure and semiconductor device structure
#17 | 2018-02-22METHOD OF FORMING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
#18 | 2017-12-21Gate patterning for AC and DC performance boost
#19 | 2017-12-19Semiconductor structure including a first transistor at a semiconductor-on-insulator region and a second transistor at a bulk region and method for the formation thereof
#20 | 2017-11-30Methods for forming integrated circuits that include a dummy gate structure
#21 | 2017-10-17Integrated circuit including a dummy gate structure and method for the formation thereof
#22 | 2017-10-05Semiconductor structure including a trench capping layer
#23 | 2017-09-21Inline monitoring of transistor-to-transistor critical dimension
#24 | 2017-06-20Process monitoring for gate cut mask
#25 | 2017-04-25Semiconductor structure including a trench capping layer and method for the formation thereof
#26 | 2017-03-16Wafer with SOI structure having a buried insulating multilayer structure and semiconductor device structure
#27 | 2017-02-09BULEX contacts in advanced FDSOI techniques
#28 | 2017-02-09Capacitor structure and method of forming a capacitor structure
#29 | 2016-12-06Method of forming a gate mask for fabricating a structure of gate lines
#30 | 2015-02-19WAFER-LESS AUTO CLEAN OF PROCESSING CHAMBER
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