Bopfingen
Germany
17
2015-10-22
The entities that hold a legal rights for patent applications filed by inventor Dittmann Olaf:
Olaf Dittmann from Bopfingen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
#2 | 2015-06-04Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element
#3 | 2013-03-28Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
#4 | 2013-02-28Optical system of a microlithographic projection exposure apparatus
#5 | 2012-11-22Illumination system of a microlithographic projection exposure apparatus
#6 | 2011-10-06Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
#7 | 2011-09-29Projection objective of a microlithographic projection exposure apparatus
#8 | 2010-06-01Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus
#9 | 2010-01-07Illumination system of a microlithographic projection exposure apparatus
#10 | 2009-11-19Projection objective of a microlithographic projection exposure apparatus
#11 | 2008-09-04Method for determining intensity distribution in the image plane of a projection exposure arrangement
#12 | 2008-08-14Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
#13 | 2008-01-03Projection exposure apparatus and method for operating the same
#14 | 2007-01-11Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus
#15 | 2006-03-30Arrangement of optical elements in a microlithographic projection exposure apparatus
#16 | 2005-09-01Catadioptric reduction objective
#17 | 2005-05-05Optical system with birefringent optical elements
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