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Inventor profile of:

Eun-Su PARK

City:

Suwon-si

Country:

South Korea

Published Applications:

10

Last publication date:

2025-03-06

Top Assignees for applications by Eun-Su PARK

The entities that hold a legal rights for patent applications filed by inventor PARK Eun-Su:

Samsung SDI Co., Ltd. 4 Yongin-si, South Korea
Cheil Industries Inc. 2 Gumi-si, Gyeongsangbuk-do, South Korea
SAMSUNG SDI CO., LTD. 2 Yongin-si, Gyeonggi-do, South Korea
CHEIL INDUSTRY, INC. 1 Gumi-Si, Gyeongsangbuk-Do, South Korea
Cheil Industries Inc. 1 Gyeongsangbuk-do, South Korea
Wuxi Hengxin Optoelectronic Materials Co., Ltd. 1 Wuxi, China

Recent patent applications by PARK Eun-Su

Eun-Su PARK from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-03-06

US20250076556A1

POLARIZING PLATE AND OPTICAL DISPLAY APPARATUS

#2 | 2023-10-05

US20230314685A1

Polarizing plate and optical display apparatus comprising the same

#3 | 2023-02-02

US20230037037A1

OPTICAL FILM, POLARIZING PLATE COMPRISING THE SAME, AND OPTICAL DISPLAY APPARATUS COMPRISING THE SAME

#4 | 2022-12-08

US20220390659A1

Polarizing plate and optical display apparatus comprising the same

#5 | 2019-04-11

US20190107657A1

Polarizing plate for light emitting display device and light emitting display device including same

#6 | 2016-06-23

US20160177133A1

Chemistry; metallurgy

Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer

#7 | 2015-11-26

US20150337168A1

Chemistry; metallurgy

Composition for forming silica based layer, and method for manufacturing silica based layer

#8 | 2015-10-01

US20150274980A1

Chemistry; metallurgy

Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer

#9 | 2015-08-13

US20150225508A1

Chemistry; metallurgy

Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming

#10 | 2015-04-02

US20150093545A1

Chemistry; metallurgy

COMPOSITION FOR A SILICA BASED LAYER, SILICA BASED LAYER, AND METHOD OF MANUFACTURING A SILICA BASED LAYER

InventorID:

1118150 ⎘