Inventor profile of:

Jin-Hee BAE

City:

Suwon-si

Country:

South Korea

Published Applications:

28

Last publication date:

2026-06-11

Top Assignees for applications by Jin-Hee BAE

The entities that hold a legal rights for patent applications filed by inventor BAE Jin-Hee:

Recent patent applications by BAE Jin-Hee

Jin-Hee BAE from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-11
US20260161089A1
Physics

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, AND METHOD AND SYSTEM OF FORMING PATTERNS USING THE SAME

#2 | 2025-07-17
US20250230355A1
Chemistry; metallurgy

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#3 | 2025-07-10
US20250224682A1
Physics

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#4 | 2025-04-17
US20250123568A1
Physics

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#5 | 2025-02-06
US20250044696A1
Physics

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#6 | 2024-11-28
US20240393698A1
Physics

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS, DEVELOPER COMPOSITION OF METAL-CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#7 | 2024-11-28
US20240393694A1
Physics

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION

#8 | 2024-11-28
US20240393684A1
Physics

METHOD OF FORMING PATTERNS

#9 | 2024-11-21
US20240385522A1
Physics

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF REMOVING EDGE BEADS UTILIZING THE COMPOSITION, AND A SYSTEM OF FORMING PATTERNS

#10 | 2024-01-18
US20240019784A1
Physics

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF DEVELOPING USING THE COMPOSITION

#11 | 2021-10-21
US20210324235A1
Chemistry; metallurgy

COMPOSITION FOR FORMING SILICA LAYER, SILICA LAYER FORMED THEREFROM, AND ELECTRONIC DEVICE INCLUDING SILICA LAYER

#12 | 2021-02-25
US20210053832A1
Chemistry; metallurgy

Composition for forming silica layer and silica layer

#13 | 2020-11-26
US20200369915A1
Chemistry; metallurgy

Composition for forming silica layer, manufacturing method for silica layer, and silica layer

#14 | 2020-11-19
US20200365400A1
Electricity

Composition for forming silica layer, silica layer and electronic device incorporating silica layer

#15 | 2019-06-20
US20190189430A1
Electricity

Composition for forming silica layer, silica layer, and electronic device

#16 | 2018-07-19
US20180204730A1
Electricity

Method of forming patterns, patterns formed according to the method, and semiconductor device including the patterns

#17 | 2018-06-14
US20180163055A1
Chemistry; metallurgy

Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer

#18 | 2017-03-30
US20170092488A1
Electricity

Method for manufacturing silica layer, silica layer, and electronic device

#19 | 2017-02-02
US20170029624A1
Chemistry; metallurgy

Composition for forming silica layer, method for manufacturing silica layer and silica layer

#20 | 2016-11-17
US20160333222A1
Chemistry; metallurgy

Composition for forming silica layer, method for manufacturing silica layer, and silica layer

#21 | 2016-06-23
US20160177133A1
Chemistry; metallurgy

Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer

#22 | 2016-06-23
US20160176718A1
Chemistry; metallurgy

Composition for forming a silica based layer, silica based layer, and electronic device

#23 | 2016-04-07
US20160099145A1
Electricity

Composition for forming silica layer, silica layer, and electronic device

#24 | 2015-11-26
US20150337168A1
Chemistry; metallurgy

Composition for forming silica based layer, and method for manufacturing silica based layer

#25 | 2015-10-01
US20150274980A1
Chemistry; metallurgy

Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer

#26 | 2015-08-13
US20150225508A1
Chemistry; metallurgy

Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming

#27 | 2015-04-02
US20150093545A1
Chemistry; metallurgy

COMPOSITION FOR A SILICA BASED LAYER, SILICA BASED LAYER, AND METHOD OF MANUFACTURING A SILICA BASED LAYER

#28 | 2010-07-01
US20100167553A1
Chemistry; metallurgy

Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same

InventorID:

1118151 ⎘