Newark, Delaware
United States
14
2020-11-19
The entities that hold a legal rights for patent applications filed by inventor Penta Naresh Kumar:
Naresh Kumar Penta from Newark, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide
#2 | 2020-09-29Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment
#3 | 2020-04-21Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon
#4 | 2019-06-20Aqueous compositions of low dishing silica particles for polysilicon polishing
#5 | 2019-03-28Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them
#6 | 2019-03-28Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them
#7 | 2019-03-28Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
#8 | 2019-03-28Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them
#9 | 2019-02-28Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
#10 | 2018-12-20Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
#11 | 2018-11-06Low-abrasive CMP slurry compositions with tunable selectivity
#12 | 2015-04-02Chemical mechanical polishing composition for polishing silicon wafers and related methods
#13 | 2014-08-12Stable, concentratable silicon wafer polishing composition and related methods
#14 | 2014-08-05Silicon wafer polishing composition and related methods
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