Boise, Idaho
United States
64
2021-03-11
The entities that hold a legal rights for patent applications filed by inventor Millward Dan B.:
Dan B. Millward from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Stamps including a self-assembled block copolymer material, and related methods
#2 | 2019-04-18Methods of forming a semiconductor device using block copolymer materials
#3 | 2018-12-20Methods of forming semiconductor device structures, and methods of forming capacitor structures
#4 | 2018-10-04Methods of forming a self-assembled block copolymer material
#5 | 2016-07-28Methods of forming a nanostructured polymer material including block copolymer materials
#6 | 2016-06-09Methods of forming semiconductor device structures including metal oxide structures
#7 | 2015-12-31SEMICONDUCTOR STRUCTURES INCLUDING SELF-ASSEMBLED POLYMER DOMAINS REGISTERED TO THE UNDERLYING SELF-ASSEMBLED POLYMER DOMAINS, TEMPLATES COMPRISING THE SAME, AND METHODS OF FORMING THE SAME
#8 | 2015-10-22SEMICONDUCTOR DEVICE STRUCTURES INCLUDING A RECTILINEAR ARRAY OF OPENINGS
#9 | 2015-07-09Stamps and methods of forming a pattern on a substrate
#10 | 2015-05-21POLYMERIC MATERIALS IN SELF-ASSEMBLED ARRAYS AND SEMICONDUCTOR STRUCTURES AND METHODS COMPRISING SUCH POLYMERIC MATERIALS
#11 | 2015-04-30Methods of forming semiconductor device structures, and methods of forming capacitor structures
#12 | 2015-03-19Methods of forming semiconductor device structures
#13 | 2014-11-06Methods of forming semiconductor device structures, and related semiconductor device structures
#14 | 2014-10-02METHODS OF FORMING A POLYMERIC MATERIAL VIA SELF-ASSEMBLY OF AMPHIPHILIC MATERIAL AND RELATED TEMPLATE STRUCTURES
#15 | 2014-09-04Semiconductor device structures comprising a polymer bonded to a base material and methods of fabrication
#16 | 2014-06-05Semiconductor device structures including metal oxide structures
#17 | 2014-04-17Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
#18 | 2014-04-10Methods of forming an array of openings in a substrate, and related methods of forming a semiconductor device structure
#19 | 2014-03-06Templates including self-assembled block copolymer films
#20 | 2013-11-07Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
#21 | 2013-10-31Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials
#22 | 2013-09-26Imaging devices, methods of forming same, and methods of forming semiconductor device structures
#23 | 2013-07-25Registered structure formation via the application of directed thermal energy to diblock copolymer films
#24 | 2013-05-23Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures
#25 | 2013-05-02Methods of forming semiconductor device structures, and related structures
#26 | 2013-01-17Methods of forming block copolymers, and block copolymer compositions
#27 | 2013-01-10Methods of patterning a substrate including multilayer antireflection coatings
#28 | 2013-01-03Crosslinkable graft polymer non preferentially wetted by polystyrene and polyethylene oxide
#29 | 2012-10-18Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
#30 | 2012-09-06Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method
#31 | 2012-09-06Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
#32 | 2012-09-06Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers
#33 | 2012-07-12Imaging devices, methods of forming same, and methods of forming semiconductor device structures
#34 | 2012-07-12Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same
#35 | 2012-06-07Polymer materials for formation of registered arrays of cylindrical pores
#36 | 2012-06-07Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
#37 | 2012-05-31Semiconductor structures including polymer material permeated with metal oxide
#38 | 2012-04-19Registered structure formation via the application of directed thermal energy to diblock copolymer films
#39 | 2012-04-05Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
#40 | 2012-03-29One-dimensional arrays of block copolymer cylinders and applications thereof
#41 | 2012-02-23Methods of forming block copolymers
#42 | 2011-12-01Zwitterionic block copolymers and methods
#43 | 2011-10-06Methods using block co-polymer self-assembly for sub-lithographic patterning
#44 | 2011-09-29Methods of forming a stamp and a stamp
#45 | 2011-06-16Zwitterionic block copolymers and methods
#46 | 2010-12-16Method to produce nanometer-sized features with directed assembly of block copolymers
#47 | 2010-11-04Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
#48 | 2010-08-12Zwitterionic block copolymers and methods
#49 | 2010-07-01Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers
#50 | 2010-04-29Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method for patterning a semiconductor structure
#51 | 2009-11-05Graphoepitaxial self-assembly of arrays of downward facing half-cylinders
#52 | 2009-10-22Multi-layer method for formation of registered arrays of cylindrical pores in polymer films
#53 | 2009-09-24Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
#54 | 2009-08-13One-dimensional arrays of block copolymer cylinders and applications thereof
#55 | 2009-03-05Zwitterionic block copolymers and methods
#56 | 2008-12-25Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
#57 | 2008-12-25Multilayer antireflection coatings, structures and devices including the same and methods of making the same
#58 | 2008-12-18Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
#59 | 2008-11-20Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method
#60 | 2008-11-06Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers
#61 | 2008-10-23Methods of patterning a substrate
#62 | 2008-09-11Registered structure formation via the application of directed thermal energy to diblock copolymer films
#63 | 2008-08-14Methods using block copolymer self-assembly for sub-lithographic patterning
#64 | 2008-07-24Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
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