Daniel Patrick Sweat

City:

Madison, Wisconsin

Country:

United States

Published Applications:

Last publication date:

2017-05-25

Top Assignees for applications by Daniel Patrick Sweat

The entities that hold a legal rights for patent applications filed by inventor Sweat Daniel Patrick:

WISCONSIN ALUMNI RESEARCH FOUNDATION 5 Madison, WI United States
Wiscousin Alumni Research Foundation 1 Madison, WI United States

Recent patent applications by Sweat Daniel Patrick

Daniel Patrick Sweat from Madison, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-05-25

US20170145139A1

Chemistry; metallurgy

Methods of making crosslinked copolymer films from inimer-containing random copolymers

#2 | 2017-05-04

US20170121555A1

Chemistry; metallurgy

Block copolymers with high flory-huggins interaction parameters for block copolymer lithography

#3 | 2015-04-09

US20150099109A1

Chemistry; metallurgy

Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography

#4 | 2014-09-18

US20140272673A1

Physics

Block copolymer-based mask structures for the growth of nanopatterned polymer brushes

#5 | 2014-09-18

US20140263164A1

Chemistry; metallurgy

Degradable neutral layers for block copolymer lithography applications

InventorID:

1123935 ⎘