Tetsuo ONO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2025-04-10

Top Assignees for applications by Tetsuo ONO

The entities that hold a legal rights for patent applications filed by inventor ONO Tetsuo:

HITACHI HIGH-TECH CORPORATION 3 Tokyo, Japan
HITACHI HIGH-TECHNOLOGIES CORPORATION 2 Tokyo, Japan
TERAOKA SEIKO CO., LTD. 1 Tokyo, Japan

Recent patent applications by ONO Tetsuo

Tetsuo ONO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-04-10

US20250118566A1

Electricity

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

#2 | 2021-12-23

US20210398777A1

Electricity

Plasma processing apparatus and plasma processing method

#3 | 2018-12-20

US20180366335A1

Electricity

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

#4 | 2018-02-15

US20180047573A1

Electricity

Plasma processing method and plasma processing device

#5 | 2017-03-30

US20170092468A1

Electricity

Plasma processing apparatus and plasma processing method

#6 | 2016-10-20

US20160307765A1

Electricity

Dry etching method

#7 | 2016-06-23

US20160181118A1

Electricity

PLASMA PROCESSING METHOD

#8 | 2016-03-17

US20160079073A1

Electricity

PLASMA PROCESSING METHOD

#9 | 2015-04-09

US20150099368A1

Electricity

DRY ETCHING METHOD

#10 | 2008-06-05

US20080128497A1

Physics

Self scanning system

InventorID:

1124205 ⎘