Fremont, California
United States
66
2026-03-26
The entities that hold a legal rights for patent applications filed by inventor Daugherty John:
John Daugherty from Fremont, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PYROCHLORE COMPONENT FOR PLASMA PROCESSING CHAMBER
#2 | 2025-12-04REFRACTORY COMPONENTS FOR A SEMICONDUCTOR PROCESSING CHAMBER
#3 | 2025-11-20CHUCKING SYSTEM WITH SILANE COUPLING AGENT
#4 | 2025-06-26METHOD AND APPARATUS FOR MEASURING PARTICLES
#5 | 2025-06-12SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING
#6 | 2025-05-01YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
#7 | 2024-11-21CONDITIONING CHAMBER COMPONENT
#8 | 2023-07-06SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING ATOMIC LAYER DEPOSITION
#9 | 2023-03-23Method for conditioning semiconductor processing chamber components
#10 | 2023-03-23YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
#11 | 2023-01-19LOW TEMPERATURE SINTERED COATINGS FOR PLASMA CHAMBERS
#12 | 2022-12-08Single crystal metal oxide plasma chamber component
#13 | 2022-10-27Wafer transport assembly with integrated buffers
#14 | 2022-08-11Chamber component cleanliness measurement system
#15 | 2022-08-04SEALANT COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
#16 | 2022-06-16SURFACE COATING TREATMENT
#17 | 2022-04-14Laminated aerosol deposition coating for aluminum components for plasma processing chambers
#18 | 2021-11-04Method and apparatus for measuring particles
#19 | 2021-07-08Conditioning chamber component
#20 | 2020-04-09COOLING SYSTEM FOR RF POWER ELECTRONICS
#21 | 2019-08-01Method to selectively pattern a surface for plasma resistant coat applications
#22 | 2019-04-18Electrode for plasma processing chamber
#23 | 2018-11-08Conditioning chamber component
#24 | 2018-08-30System implementing machine learning in complex multivariate wafer processing equipment
#25 | 2018-08-16COOLING SYSTEM FOR RF POWER ELECTRONICS
#26 | 2018-08-16Wafer transport assembly with integrated buffers
#27 | 2018-05-24PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
#28 | 2018-05-10COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACES OF A COMPONENT OF A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS
#29 | 2018-03-22Method and process of implementing machine learning in complex multivariate wafer processing equipment
#30 | 2018-02-15Method for conditioning silicon part
#31 | 2018-02-01Systems for removing and replacing consumable parts from a semiconductor process module in situ
#32 | 2017-04-27Systems for Removing and Replacing Consumable Parts from a Semiconductor Process Module in Situ
#33 | 2017-04-20Wafer transport assembly with integrated buffers
#34 | 2017-04-20Load lock interface and integrated post-processing module
#35 | 2017-04-20Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs
#36 | 2017-02-09PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
#37 | 2017-01-19USE OF SINTERED NANOGRAINED YTTRIUM-BASED CERAMICS AS ETCH CHAMBER COMPONENTS
#38 | 2016-12-29USE OF PLASMA-RESISTANT ATOMIC LAYER DEPOSITION COATINGS TO EXTEND THE LIFETIME OF POLYMER COMPONENTS IN ETCH CHAMBERS
#39 | 2016-12-29USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGAINST CORROSION, EROSION, AND ARCING
#40 | 2016-11-22Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs
#41 | 2015-11-26Dense oxide coated component of a plasma processing chamber and method of manufacture thereof
#42 | 2015-10-08Monolithic ceramic component of gas delivery system and method of making and use thereof
#43 | 2015-08-20SYSTEM AND METHOD FOR PERFORMING HOT WATER SEAL ON ELECTROSTATIC CHUCK
#44 | 2015-07-02COMPONENT OF A PLASMA PROCESSING APPARATUS INCLUDING AN ELECTRICALLY CONDUCTIVE AND NONMAGNETIC COLD SPRAYED COATING
#45 | 2015-07-02Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
#46 | 2014-10-23COLD SPRAY BARRIER COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF
#47 | 2014-10-02Dense oxide coated component of a plasma processing chamber and method of manufacture thereof
#48 | 2014-09-18Corrosion resistant aluminum coating on plasma chamber components
#49 | 2014-09-18Portable sonic particle removal tool with a chemically controlled working fluid
#50 | 2014-06-05Method of wet cleaning aluminum chamber parts
#51 | 2014-05-08PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF
#52 | 2013-10-10Dielectric window cleaning apparatuses
#53 | 2013-06-27Plasma Processing Devices With Corrosion Resistant Components
#54 | 2013-06-13System and method for cleaning gas injectors
#55 | 2013-05-02Mixed acid cleaning assemblies
#56 | 2013-05-02Methods for mixed acid cleaning of showerhead electrodes
#57 | 2013-05-02Method of cleaning aluminum plasma chamber parts
#58 | 2013-04-25Automated bubble detection apparatus and method
#59 | 2013-02-28Method for performing hot water seal on electrostatic chuck
#60 | 2012-06-14Extending lifetime of yttrium oxide as a plasma chamber material
#61 | 2010-02-25Method for inspecting electrostatic chucks with Kelvin probe analysis
#62 | 2009-10-22COMPONENTS FOR USE IN A PLASMA CHAMBER HAVING REDUCED PARTICLE GENERATION AND METHOD OF MAKING
#63 | 2009-06-18Vacuum sealing radio frequency (RF) and low frequency conducting actuator
#64 | 2008-07-17Extending lifetime of yttrium oxide as a plasma chamber material
#65 | 2007-02-15Method and apparatus for tuning a set of plasma processing steps
#66 | 2006-03-30Methods and apparatus for tuning a set of plasma processing steps
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