Patrik HOFFMANN

City:

Epalinges

Country:

Switzerland

Published Applications:

Last publication date:

2015-04-30

Top Assignees for applications by Patrik HOFFMANN

The entities that hold a legal rights for patent applications filed by inventor HOFFMANN Patrik:

ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) 3 Lausanne, Switzerland
ASULAB S.A. 2 Marin, Switzerland
FEI Company 1 Hillsboro, OR United States
Ecole Polytechnique Federales de Lausanne 1 Lausanne, Switzerland
KBA-GIORI S.A. 1 Lausanne, Switzerland

Recent patent applications by HOFFMANN Patrik

Patrik HOFFMANN from Epalinges, CH has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-04-30

US20150114566A1

Chemistry; metallurgy

LARGE AREA DEPOSITION IN HIGH VACUUM WITH HIGH THICKNESS UNIFORMITY

#2 | 2012-02-16

US20120037077A1

Chemistry; metallurgy

Large area deposition in high vacuum with high thickness uniformity

#3 | 2010-11-04

US20100278707A1

Performing operations; transporting

Method for recovering silicon from sawing waste

#4 | 2010-08-12

US20100203431A1

Chemistry; metallurgy

Beam-induced etching

#5 | 2008-11-11

US10793657

Substrate with transparent electrodes and devices incorporating it

#6 | 2008-06-19

US20080145959A1

Physics

Method of substrate with transparent electrodes and devices incorporating it

#7 | 2007-08-23

US20070193519A1

Chemistry; metallurgy

Large area deposition in high vacuum with high thickness uniformity

#8 | 2006-10-12

US20060228634A1

Chemistry; metallurgy

Beam-induced etching

#9 | 2006-09-07

US20060197333A1

Performing operations; transporting

Process for providing marking on security papers

#10 | 2005-11-10

US20050247120A1

Performing operations; transporting

Gas phase deposition of perfluorinated alkyl silanes

InventorID:

1140586 ⎘