Austin, Texas
United States
52
2026-01-01
The entities that hold a legal rights for patent applications filed by inventor Cherala Anshuman:
Anshuman Cherala from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND APPARATUS FOR BONDING WITH CURVED BONDING HEADS
#2 | 2025-11-13APPARATUS INCLUDING A BONDING HEAD AND A METHOD OF USING THE SAME
#3 | 2025-05-22SYSTEM INCLUDING A PLURALITY OF DIE HEADS WITH RELEASABLY COUPLED DIE CHUCKS AND A METHOD OF USING THE SAME
#4 | 2024-12-05APPARATUS INCLUDING A BONDING HEAD AND A METHOD OF USING THE SAME
#5 | 2024-07-04METHOD OF FORMING A DIE STRUCTURE INCLUDING A CONTROLLED THICKNESS LAYER AND AN APPARATUS FOR PERFORMING THE METHOD
#6 | 2024-03-28Apparatus including a plurality of heads and a method of using the same
#7 | 2024-02-29Nanofabrication method with correction of distortion within an imprint system
#8 | 2024-02-01SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL
#9 | 2023-04-27Apparatus and method for optimizing actuator forces
#10 | 2023-04-20Nanoimprint lithography template with peripheral pockets, system of using the template, and method of using the template
#11 | 2022-12-08Template replication
#12 | 2021-12-30Nanofabrication method with correction of distortion within an imprint system
#13 | 2021-09-30Method and apparatus to improve frame cure imaging resolution for extrusion control
#14 | 2021-06-24Nanofabrication method with correction of distortion within an imprint system
#15 | 2021-06-24Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
#16 | 2021-05-27Systems and methods for curing a shaped film
#17 | 2021-04-29Systems and methods for curing an imprinted field
#18 | 2021-03-04Overlay improvement in nanoimprint lithography
#19 | 2019-10-03Apparatus for use in forming an adaptive layer and a method of using the same
#20 | 2019-02-28Safe separation for nano imprinting
#21 | 2019-01-31Overlay improvement in nanoimprint lithography
#22 | 2019-01-31Real-time correction of template deformation in nanoimprint lithography
#23 | 2018-06-21Adaptive chucking system
#24 | 2018-05-17Template replication
#25 | 2017-11-23Method of imprinting to correct for a distortion within an imprint system
#26 | 2017-05-11Multi-field overlay control in jet and flash imprint lithography
#27 | 2017-02-16Imprint apparatus, and method of manufacturing article
#28 | 2017-02-02Imprint apparatus and article manufacturing method
#29 | 2016-04-28Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures
#30 | 2015-06-18SAFE SEPARATION FOR NANO IMPRINTING
#31 | 2015-05-14Low contact imprint lithography template chuck system for improved overlay correction
#32 | 2011-10-27Safe separation for nano imprinting
#33 | 2011-04-14LARGE AREA LINEAR ARRAY NANOIMPRINTING
#34 | 2011-01-20Chucking system for nano-manufacturing
#35 | 2010-12-16Chucking System for Nano-Manufacturing
#36 | 2010-10-14METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES
#37 | 2010-03-11Chucking system comprising an array of fluid chambers
#38 | 2009-06-04Porous template and imprinting stack for nano-imprint lithography
#39 | 2008-01-29Magnification correction employing out-of-plane distortion of a substrate
#40 | 2007-12-13Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
#41 | 2007-11-29Partial vacuum environment imprinting
#42 | 2007-10-04System to vary dimensions of a thin template
#43 | 2007-08-16Chucking system comprising an array of fluid chambers
#44 | 2006-08-03Method of retaining a substrate to a wafer chuck
#45 | 2006-08-03Method of separating a mold from a solidified layer disposed on a substrate
#46 | 2006-08-03Chucking system for nano-manufacturing
#47 | 2006-01-05Apparatus to vary dimensions of a substrate during nano-scale manufacturing
#48 | 2006-01-05System for varying dimensions of a substrate during nanoscale manufacturing
#49 | 2005-12-08System and method for improvement of alignment and overlay for microlithography
#50 | 2005-12-08System for magnification and distortion correction during nano-scale manufacturing
#51 | 2005-12-08Method of varying dimensions of a substrate during nano-scale manufacturing
#52 | 2005-04-21Applying imprinting material to substrates employing electromagnetic fields
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