Steffen Marschmeyer

City:

Lebus

Country:

Germany

Published Applications:

Last publication date:

2018-10-04

Top Assignees for applications by Steffen Marschmeyer

The entities that hold a legal rights for patent applications filed by inventor Marschmeyer Steffen:

IHP GMBH—INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS/LEIBNIZ-INSTITUT FUR INNOVATIVE MIKROELEKTRONIK 1 Frankfurt, Germany
IHP GmbH—Innovations for High Performance Microelectronics/Leibniz-Institut fur Innovative Mikroelekronik 1 Frankfurt (Oder), Germany
IHP GmbH—Innovations for High Perforamce Microelectronics/Leibniz-Institut fur Innovative Mikroelektronik 1 Frankfurt (Oder), Germany

Recent patent applications by Marschmeyer Steffen

Steffen Marschmeyer from Lebus, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-10-04

US20180286751A1

Electricity

Technological method for preventing, by means of buried etch stop layers, the creation of vertical/lateral inhomogeneities when etching through-silicon vias

#2 | 2015-05-21

US20150140771A1

Electricity

Method for fabricating a bipolar transistor having self-aligned emitter contact

#3 | 2012-01-05

US20120001192A1

Electricity

Bipolar transistor having self-adjusted emitter contact

InventorID:

1168553 ⎘