Inventor profile of:

Anton deVilliers

City:

Boise, Idaho

Country:

United States

Published Applications:

33

Last publication date:

2016-10-27

Top Assignees for applications by Anton deVilliers

The entities that hold a legal rights for patent applications filed by inventor deVilliers Anton:

Recent patent applications by deVilliers Anton

Anton deVilliers from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-10-27
US20160315223A1
Electricity

Textured devices

#2 | 2015-12-03
US20150349204A1
Electricity

Epitaxial devices

#3 | 2014-09-25
US20140284614A1
Electricity

Epitaxial devices

#4 | 2014-09-04
US20140247476A1
Physics

LITHOGRAPHY WAVE-FRONT CONTROL SYSTEM AND METHOD

#5 | 2014-04-17
US20140106280A1
Physics

Lithography methods, methods for forming patterning tools and patterning tools

#6 | 2014-02-27
US20140054756A1
Electricity

ANTI SPACER PROCESS AND SEMICONDUCTOR STRUCTURE GENERATED BY THE ANTI SPACER PROCESS

#7 | 2013-12-05
US20130323924A1
Physics

Methods of forming a pattern in a material and methods of forming openings in a material to be patterned

#8 | 2013-12-05
US20130323628A1
Physics

Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns

#9 | 2013-11-21
US20130309871A1
Electricity

Methods of forming a masking pattern for integrated circuits

#10 | 2013-10-03
US20130256692A1
Electricity

Method for epitaxial devices

#11 | 2013-08-22
US20130216795A1
Physics

Reticle design for the reduction of lens heating phenomenon

#12 | 2013-02-28
US20130052566A1
Physics

Lithography methods, methods for forming patterning tools and patterning tools

#13 | 2013-01-03
US20130004889A1
Electricity

Methods of forming patterned masks

#14 | 2012-12-20
US20120322269A1
Electricity

Methods of fabricating substrates

#15 | 2012-12-13
US20120314196A1
Physics

Lithography wave-front control system and method

#16 | 2012-11-22
US20120295445A1
Electricity

Methods of fabricating substrates

#17 | 2012-10-11
US20120257177A1
Physics

Illumination design for lens heating mitigation

#18 | 2012-10-11
US20120256191A1
Electricity

Epitaxial devices

#19 | 2012-06-28
US20120164566A1
Physics

Patterning mask and method of formation of mask using step double patterning

#20 | 2012-05-10
US20120115074A1
Electricity

Methods of forming patterned masks

#21 | 2012-03-01
US20120052416A1
Physics

Reticles, and methods of mitigating asymmetric lens heating in photolithography

#22 | 2012-02-16
US20120038895A1
Physics

Lens heating compensation in photolithography

#23 | 2011-12-29
US20110316021A1
Electricity

Epitaxial growth method

#24 | 2011-12-15
US20110306206A1
Electricity

Methods of forming contact openings and methods of increasing contact area in only one of X and Y axes in the fabrication of integrated circuitry

#25 | 2011-12-15
US20110305997A1
Physics

Methods of forming a pattern in a material and methods of forming openings in a material to be patterned

#26 | 2011-12-08
US20110297646A1
Physics

Methods of forming patterns on substrates

#27 | 2011-09-08
US20110217843A1
Physics

Patterning mask and method of formation of mask using step double patterning

#28 | 2010-06-10
US20100144153A1
Electricity

Methods of fabricating substrates

#29 | 2010-06-10
US20100144151A1
Electricity

Methods of fabricating substrates

#30 | 2010-06-10
US20100144150A1
Electricity

Methods of fabricating substrates

#31 | 2010-05-27
US20100130016A1
Electricity

Methods of forming a masking pattern for integrated circuits

#32 | 2010-03-04
US20100055913A1
Physics

Methods of forming a photoresist-comprising pattern on a substrate

#33 | 2009-11-26
US20090291397A1
Physics

Methods of forming structures supported by semiconductor substrates

InventorID:

11719 ⎘