Shanghai
China
20
2026-01-01
The entities that hold a legal rights for patent applications filed by inventor Tan Jun:
Jun Tan from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR MANUFACTURING SEMICONDUCTOR EPITAXIAL LAYER
#2 | 2025-09-11METHOD FOR PRODUCING A CURVED LAMINATED GLAZING
#3 | 2024-11-07METHOD AND APPARATUS FOR CALCULATING CARBON INTENSITIES, TERMINAL AND STORAGE MEDIUM
#4 | 2024-08-22METHOD FOR MEASURING THICKNESS OF SILICON EPITAXIAL LAYER
#5 | 2024-05-23METHOD FOR MANUFACTURING SOURCE/DRAIN EPITAXIAL LAYER OF FDSOI MOSFET
#6 | 2024-05-23Epitaxial growth method for FDSOI hybrid region
#7 | 2023-10-19Reaction Device for Improving Epitaxial Growth Uniformity
#8 | 2021-12-02Fin semiconductor device and method for making the same
#9 | 2021-12-02Fin semiconductor device and method for making the same
#10 | 2021-05-20Exterior trimming part for pillar of vehicle
#11 | 2021-02-04Semiconductor device and method for manufacturing the same
#12 | 2018-12-20SiGe source/drain structure
#13 | 2018-08-23Embedded SiGe epitaxy test pad
#14 | 2018-06-07SiGe source/drain structure and preparation method thereof
#15 | 2017-08-31Method of fabricating semiconductor device and semiconductor device fabricated thereby
#16 | 2016-10-20SHAPED CAVITY FOR SIGE FILLING MATERIAL
#17 | 2016-10-20Shaped cavity for SiGe filling material
#18 | 2016-08-04Embedded SiGe epitaxy test pad
#19 | 2016-05-03Methods and systems for using conformal filling layers to improve device surface uniformity
#20 | 2013-02-28Estimating clock skew
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