Eun-Bi PARK

City:

Suwon-si

Country:

South Korea

Published Applications:

Last publication date:

2026-05-21

Top Assignees for applications by Eun-Bi PARK

The entities that hold a legal rights for patent applications filed by inventor PARK Eun-Bi:

Eun-Bi PARK from Suwon-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

CMP SLURRY COMPOSITION FOR POLISHING PATTERNED TUNGSTEN WAFER AND METHOD OF POLISHING PATTERNED TUNGSTEN WAFER USING THE SAME

Photosensitive resin composition and color filter using the same

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device

InventorID:

1197650 ⎘