Jyoetsu
Japan
29
2019-02-07
The entities that hold a legal rights for patent applications filed by inventor KORI Daisuke:
Daisuke KORI from Jyoetsu, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Composition for forming organic film
#2 | 2018-01-11Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
#3 | 2017-07-13Method for forming multi-layer film and patterning process
#4 | 2017-06-29Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
#5 | 2017-06-29Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
#6 | 2017-01-19Resist underlayer film composition, patterning process, and compound
#7 | 2017-01-19Composition for forming resist underlayer film and patterning process
#8 | 2016-12-08Resist under layer film composition and patterning process
#9 | 2016-11-24Resist under layer film composition and patterning process
#10 | 2016-11-17Organic film composition, process for forming organic film, patterning process, and compound
#11 | 2016-03-03Method for producing semiconductor apparatus substrate
#12 | 2016-02-25Method for producing a composition for forming an organic film
#13 | 2016-02-25Ultraviolet absorber, composition for forming a resist under layer film, and patterning process
#14 | 2016-01-28Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#15 | 2016-01-21Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#16 | 2015-08-06Method for cleaning and drying semiconductor substrate
#17 | 2014-11-13Method for forming a resist under layer film and patterning process
#18 | 2013-12-19Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#19 | 2013-07-04Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition
#20 | 2013-04-11Resist top coat composition and patterning process
#21 | 2013-04-11Resist underlayer film composition and patterning process using the same
#22 | 2013-03-07Positive resist composition and patterning process
#23 | 2013-03-07Positive resist composition and patterning process
#24 | 2012-07-19Resist underlayer film composition and patterning process using the same
#25 | 2012-07-05Resist underlayer film composition and patterning process using the same
#26 | 2012-06-07Resist underlayer film composition and patterning process using the same
#27 | 2012-05-03Resist underlayer film composition and patterning process using the same
#28 | 2011-08-11Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
#29 | 2011-07-21Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
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