Dresden
Germany
4
2015-07-16
The entities that hold a legal rights for patent applications filed by inventor Radwan Mohammed:
Mohammed Radwan from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-up
#2 | 2012-08-23Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-up
#3 | 2012-02-02Method of controlling critical dimensions of vias in a metallization system of a semiconductor device during silicon-ARC etch
#4 | 2012-02-02Method of Controlling Critical Dimensions of Trenches in a Metallization System of a Semiconductor Device During Etch of an Etch Stop Layer
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