Ke Wang

City:

Dalian

Country:

China

Published Applications:

Last publication date:

2016-02-04

Top Assignees for applications by Ke Wang

The entities that hold a legal rights for patent applications filed by inventor Wang Ke:

Ke Wang from Dalian, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

CHEMICAL-MECHANICAL PLANARIZATION OF SUBSTRATES CONTAINING COPPER, RUTHENIUM, AND TANTALUM LAYERS

CHEMICAL-MECHANICAL PLANARIZATION OF SUBSTRATES CONTAINING COPPER, RUTHENIUM, AND TANTALUM LAYERS

InventorID:

12483 ⎘