Oberkochen
Germany
80
2025-12-18
The entities that hold a legal rights for patent applications filed by inventor Patra Michael:
Michael Patra from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD FOR THE INTERFEROMETRIC DETERMINATION OF THE SURFACE SHAPE OF A TEST OBJECT
#2 | 2025-02-06ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
#3 | 2024-08-01OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#4 | 2024-08-01METHOD FOR DETERMINING A POSITION OF A MIRROR
#5 | 2024-07-25EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE EUV
#6 | 2024-01-11OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#7 | 2023-07-13DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF A PROJECTION EXPOSURE SYSTEM
#8 | 2022-05-26OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION
#9 | 2022-02-24Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography
#10 | 2021-03-18Stop for arrangement in a constriction of an EUV illumination beam
#11 | 2021-02-25Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask
#12 | 2020-11-05Illumination optic for projection lithography
#13 | 2020-07-09Optical system for a projection exposure apparatus
#14 | 2020-03-26Projection exposure method and projection exposure apparatus for microlithography
#15 | 2020-01-16Optical assembly for guiding an output beam of a free electron laser
#16 | 2019-08-08Method for the microlithographic production of microstructured components
#17 | 2019-07-04Projection exposure method and projection exposure apparatus for microlithography
#18 | 2018-11-22Illumination system for illuminating a mask in a microlithographic exposure apparatus
#19 | 2018-08-30METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#20 | 2018-08-09Illumination system for EUV projection lithography
#21 | 2017-12-07Illumination system for illuminating a mask in a microlithographic exposure apparatus
#22 | 2017-10-12Optical component for use in a radiation source module of a projection exposure system
#23 | 2017-07-06Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens
#24 | 2017-06-22Facet mirror for an illumination optical unit for projection lithography
#25 | 2017-06-08Illumination optical unit for EUV projection lithography
#26 | 2017-03-23ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM
#27 | 2017-02-16Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens
#28 | 2017-02-09Illumination system of a microlithographic projection exposure apparatus
#29 | 2017-01-05EUV light source for a lighting device of a microlithographic projection exposure apparatus
#30 | 2016-12-22Optical component
#31 | 2016-12-08Beam distributing optical device and associated unit, system and apparatus
#32 | 2016-09-15Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#33 | 2016-09-01Illumination system for EUV projection lithography
#34 | 2016-06-30Illumination system for illuminating a mask in a microlithographic exposure apparatus
#35 | 2016-06-30Illumination optical unit for EUV projection lithography
#36 | 2016-06-30Illumination optical unit and illumination system for EUV projection lithography
#37 | 2016-06-16Facet mirror for a projection exposure apparatus
#38 | 2016-06-02Illumination optical unit for EUV projection lithography
#39 | 2016-03-10Illumination system of a microlithographic projection exposure apparatus
#40 | 2016-03-03System for producing structures in a substrate
#41 | 2015-10-22Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
#42 | 2015-10-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#43 | 2015-08-20Illumination system of a microlithographic projection exposure apparatus
#44 | 2015-07-16Monitor system for determining orientations of mirror elements and EUV lithography system
#45 | 2015-07-16Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
#46 | 2015-07-02Illumination system of a microlithographic projection exposure apparatus
#47 | 2015-06-25Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#48 | 2015-06-18Method of operating a microlithographic apparatus
#49 | 2015-05-21EUV light source
#50 | 2015-05-07Illumination system for an EUV projection lithographic projection exposure apparatus
#51 | 2015-04-02Illumination optical unit
#52 | 2015-03-26Projection exposure apparatus and method for controlling a projection exposure apparatus
#53 | 2015-03-12Illumination system of a microlithographic projection exposure apparatus
#54 | 2015-03-05Assembly for a projection exposure apparatus for EUV projection lithography
#55 | 2015-02-05Illumination optical unit for EUV projection lithography
#56 | 2015-01-29Optical system for a microlithographic projection exposure apparatus
#57 | 2015-01-15Illumination optical unit for projection lithography
#58 | 2014-12-25Mask for microlithography and scanning projection exposure method utilizing the mask
#59 | 2014-12-18Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit
#60 | 2014-12-11Illumination optical unit for EUV projection lithography
#61 | 2014-08-21Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#62 | 2014-08-14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#63 | 2014-07-31MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#64 | 2013-11-21Illumination system of a microlithographic projection exposure apparatus
#65 | 2013-09-26Illumination system for illuminating a mask in a microlithographic exposure apparatus
#66 | 2013-08-01Method for setting an illumination geometry for an illumination optical unit for EUV projection lithography
#67 | 2013-05-09Illumination system of a microlithographic projection exposure apparatus
#68 | 2013-03-28Microlithography illumination optical system and microlithography projection exposure apparatus including same
#69 | 2013-03-07Illumination system of a microlithographic projection exposure apparatus
#70 | 2012-11-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#71 | 2012-05-03Microlithographic projection exposure apparatus and related method
#72 | 2012-04-26Polarization actuator
#73 | 2012-01-05Microlithographic projection exposure apparatus
#74 | 2011-12-15Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source
#75 | 2011-08-11Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
#76 | 2010-11-11Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#77 | 2010-11-11Microlithographic projection exposure apparatus
#78 | 2010-10-21Illumination system for illuminating a mask in a microlithographic exposure apparatus
#79 | 2010-02-18Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#80 | 2009-10-22ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS
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