Daniel J. Dechene

City:

Wappingers Falls, New York

Country:

United States

Published Applications:

Last publication date:

2018-08-16

Top Assignees for applications by Daniel J. Dechene

The entities that hold a legal rights for patent applications filed by inventor Dechene Daniel J.:

INTERNATIONAL BUSINESS MACHINES CORPORATION 2 ARMONK, NY United States
GLOBALFOUNDRIES Inc. 2 Grand Cayman, Cayman Islands
SAMSUNG ELECTRONICS CO., LTD. 1 Gyeonggi-Do, South Korea

Recent patent applications by Dechene Daniel J.

Daniel J. Dechene from Wappingers Falls, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-08-16

US20180233361A1

Electricity

Dummy pattern addition to improve CD uniformity

#2 | 2016-02-02

US14533629

Electricity

Patterning assist feature to mitigate reactive ion etch microloading effect

#3 | 2015-08-20

US20150234974A1

Physics

MULTIPLE PATTERNING DESIGN WITH REDUCED COMPLEXITY

#4 | 2014-02-18

US13744606

Fin design level mask decomposition for directed self assembly

InventorID:

1264495 ⎘