Pine Brook, New Jersey
United States
14
2020-03-19
The entities that hold a legal rights for patent applications filed by inventor Glodde Martin:
Martin Glodde from Pine Brook, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
#2 | 2019-09-19Polymer brushes for extreme ultraviolet photolithography
#3 | 2019-02-28Polymer brushes for extreme ultraviolet photolithography
#4 | 2018-11-22Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
#5 | 2018-10-04Adhesion of polymers on silicon substrates
#6 | 2018-08-16Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
#7 | 2018-08-16Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
#8 | 2018-08-16Method to increase the lithographic process window of extreme ultra violet negative tone development resists
#9 | 2018-08-16Method to increase the lithographic process window of extreme ultra violet negative tone development resists
#10 | 2017-06-06Wet strippable gap fill materials
#11 | 2016-09-22Patterning process using a boron phosphorus silicon glass film
#12 | 2016-05-05Dielectric tone inversion materials
#13 | 2016-03-08Dielectric tone inversion materials
#14 | 2015-09-10Deep well implant using blocking mask
1284873 ⎘