Ridgefield, Connecticut
United States
33
2026-06-04
The entities that hold a legal rights for patent applications filed by inventor White Daniela:
Daniela White from Ridgefield, US has applied for patents for these inventions. The list has both pending applications and granted patents:
COLORLESS, PARTICLE-FREE, AMINOSILANE-CONTAINING WET ETCH FORMULATIONS
#2 | 2026-03-12MICROELECTRONIC DEVICE CLEANING COMPOSITION
#3 | 2026-02-12CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR
#4 | 2026-01-15COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES
#5 | 2025-09-04COMPOSITION FOR POST-CMP CLEANING
#6 | 2023-12-21METHOD FOR ETCHING POLYSILICON
#7 | 2023-12-14CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR
#8 | 2023-10-12POST CMP CLEANING COMPOSITION
#9 | 2023-09-21MICROELECTRONIC DEVICE CLEANING COMPOSITION
#10 | 2023-05-25MICROELECTRONIC DEVICE CLEANING COMPOSITION
#11 | 2023-02-02METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM
#12 | 2022-12-15COMPOSITIONS AND METHODS FOR REDUCING INTERACTION BETWEEN ABRASIVE PARTICLES AND A CLEANING BRUSH
#13 | 2022-10-20CLEANING COMPOSITION
#14 | 2022-10-20Formulations for high selective silicon nitride etch
#15 | 2022-09-01Wet etching composition and method
#16 | 2022-04-07Post CMP cleaning compositions
#17 | 2022-04-07Microelectronic Device Cleaning Composition
#18 | 2022-02-03Compositions and methods for selectively etching silicon nitride films
#19 | 2021-10-21Method and composition for etching molybdenum
#20 | 2021-04-15Wet etching composition and method
#21 | 2021-02-25Formulations for high selective silicon nitride etch
#22 | 2020-10-08Method to Improve Dispersibility of a Material Having Low Solubility in Water
#23 | 2020-08-13Ceria removal compositions
#24 | 2020-06-25Compositions and methods for post-CMP cleaning of cobalt substrates
#25 | 2020-06-11Post chemical mechanical polishing cleaning compositions
#26 | 2020-05-14Post CMP cleaning composition
#27 | 2020-03-05Post CMP cleaning compositions for ceria particles
#28 | 2020-01-23Cleaning composition with corrosion inhibitor
#29 | 2019-06-13Tungsten post-CMP cleaning composition
#30 | 2019-06-06Compositions and methods for reducing interaction between abrasive particles and a cleaning brush
#31 | 2018-10-11Post chemical mechanical polishing formulations and method of use
#32 | 2018-07-19Compositions and methods for removing ceria particles from a surface
#33 | 2015-10-15METHOD TO IMPROVE DISPERSIBILITY OF A MATERIAL HAVING LOW SOLUBILITY IN WATER
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