Inventor profile of:

Daniela White

City:

Ridgefield, Connecticut

Country:

United States

Published Applications:

33

Last publication date:

2026-06-04

Top Assignees for applications by Daniela White

The entities that hold a legal rights for patent applications filed by inventor White Daniela:

Recent patent applications by White Daniela

Daniela White from Ridgefield, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-04
US20260152690A1
Chemistry; metallurgy

COLORLESS, PARTICLE-FREE, AMINOSILANE-CONTAINING WET ETCH FORMULATIONS

#2 | 2026-03-12
US20260071149A1
Chemistry; metallurgy

MICROELECTRONIC DEVICE CLEANING COMPOSITION

#3 | 2026-02-12
US20260043148A1
Chemistry; metallurgy

CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR

#4 | 2026-01-15
US20260015560A1
Chemistry; metallurgy

COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES

#5 | 2025-09-04
US20250277171A1
Chemistry; metallurgy

COMPOSITION FOR POST-CMP CLEANING

#6 | 2023-12-21
US20230407176A1
Chemistry; metallurgy

METHOD FOR ETCHING POLYSILICON

#7 | 2023-12-14
US20230399754A1
Chemistry; metallurgy

CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR

#8 | 2023-10-12
US20230323248A1
Chemistry; metallurgy

POST CMP CLEANING COMPOSITION

#9 | 2023-09-21
US20230295537A1
Chemistry; metallurgy

MICROELECTRONIC DEVICE CLEANING COMPOSITION

#10 | 2023-05-25
US20230159866A1
Chemistry; metallurgy

MICROELECTRONIC DEVICE CLEANING COMPOSITION

#11 | 2023-02-02
US20230030323A1
Chemistry; metallurgy

METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM

#12 | 2022-12-15
US20220395865A1
Performing operations; transporting

COMPOSITIONS AND METHODS FOR REDUCING INTERACTION BETWEEN ABRASIVE PARTICLES AND A CLEANING BRUSH

#13 | 2022-10-20
US20220336210A1
Electricity

CLEANING COMPOSITION

#14 | 2022-10-20
US20220333012A1
Chemistry; metallurgy

Formulations for high selective silicon nitride etch

#15 | 2022-09-01
US20220275276A1
Chemistry; metallurgy

Wet etching composition and method

#16 | 2022-04-07
US20220106542A1
Chemistry; metallurgy

Post CMP cleaning compositions

#17 | 2022-04-07
US20220106541A1
Chemistry; metallurgy

Microelectronic Device Cleaning Composition

#18 | 2022-02-03
US20220033710A1
Chemistry; metallurgy

Compositions and methods for selectively etching silicon nitride films

#19 | 2021-10-21
US20210324525A1
Chemistry; metallurgy

Method and composition for etching molybdenum

#20 | 2021-04-15
US20210108140A1
Chemistry; metallurgy

Wet etching composition and method

#21 | 2021-02-25
US20210054287A1
Chemistry; metallurgy

Formulations for high selective silicon nitride etch

#22 | 2020-10-08
US20200315232A1
Human necessities

Method to Improve Dispersibility of a Material Having Low Solubility in Water

#23 | 2020-08-13
US20200255770A1
Chemistry; metallurgy

Ceria removal compositions

#24 | 2020-06-25
US20200199500A1
Chemistry; metallurgy

Compositions and methods for post-CMP cleaning of cobalt substrates

#25 | 2020-06-11
US20200181535A1
Chemistry; metallurgy

Post chemical mechanical polishing cleaning compositions

#26 | 2020-05-14
US20200148979A1
Chemistry; metallurgy

Post CMP cleaning composition

#27 | 2020-03-05
US20200071642A1
Chemistry; metallurgy

Post CMP cleaning compositions for ceria particles

#28 | 2020-01-23
US20200024554A1
Chemistry; metallurgy

Cleaning composition with corrosion inhibitor

#29 | 2019-06-13
US20190177671A1
Chemistry; metallurgy

Tungsten post-CMP cleaning composition

#30 | 2019-06-06
US20190168265A1
Performing operations; transporting

Compositions and methods for reducing interaction between abrasive particles and a cleaning brush

#31 | 2018-10-11
US20180291309A1
Chemistry; metallurgy

Post chemical mechanical polishing formulations and method of use

#32 | 2018-07-19
US20180204736A1
Electricity

Compositions and methods for removing ceria particles from a surface

#33 | 2015-10-15
US20150289548A1
Human necessities

METHOD TO IMPROVE DISPERSIBILITY OF A MATERIAL HAVING LOW SOLUBILITY IN WATER

InventorID:

1318538 ⎘