Shanghai
China
15
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Wang Wenjun:
Wenjun Wang from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
DRYING APPARATUS AND METHOD FOR DRYING SUBSTRATE USING SUPERCRITICAL FLUID
#2 | 2026-04-30HEAT TREATMENT DEVICE
#3 | 2025-09-11METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBSTRATES
#4 | 2025-07-17OPTIMIZATION METHOD BASED ON MEASUREMENT DATA OF ULTRASONIC GAS METER
#5 | 2025-04-24COATING AND DEVELOPING DEVICE
#6 | 2025-04-10ULTRASONIC GAS METER BASED ON SHUNT METERING DEVICE
#7 | 2025-03-13ANTI-INTERFERENCE STRUCTURE FOR ULTRASONIC GAS METER
#8 | 2025-01-02SUBSTRATE PROCESSING APPARATUS AND METHOD
#9 | 2023-05-11METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBSTRATES
#10 | 2022-11-03Substrate cleaning method and apparatus
#11 | 2021-03-11Coater with automatic cleaning function and coater automatic cleaning method
#12 | 2020-09-17Substrate heat treatment apparatus
#13 | 2019-10-10Substrate supporting apparatus
#14 | 2017-08-31Coater with automatic cleaning function and coater automatic cleaning method
#15 | 2015-11-12Substrate supporting apparatus
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