Oberkochen
Germany
35
2018-12-13
The entities that hold a legal rights for patent applications filed by inventor Mann Hans-Jürgen:
Hans-Jürgen Mann from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for three-dimensionally measuring a 3D aerial image of a lithography mask
#2 | 2017-05-11Method for three-dimensionally measuring a 3D aerial image of a lithography mask
#3 | 2017-05-11Imaging optical unit for a metrology system for examining a lithography mask
#4 | 2013-03-14Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type
#5 | 2012-11-22Reflective optical element and EUV lithography appliance
#6 | 2011-11-10Catoptric objectives and systems using catoptric objectives
#7 | 2011-10-06Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
#8 | 2011-09-22Method and lithography device with a mask reflecting light
#9 | 2010-06-03Catoptric objectives and systems using catoptric objectives
#10 | 2009-10-08Reflective optical element and EUV lithography appliance
#11 | 2008-12-25CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES
#12 | 2008-11-13Method for distortion correction in a microlithographic projection exposure apparatus
#13 | 2008-08-14Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
#14 | 2008-06-128-mirror microlithography projection objective
#15 | 2008-05-13Method for distortion correction in a microlithographic projection exposure apparatus
#16 | 2007-08-23Groupwise corrected objective
#17 | 2007-07-05Projection system for EUV lithography
#18 | 2007-04-12Masks, lithography device and semiconductor component
#19 | 2007-03-29Projection system for EUV lithography
#20 | 2007-03-018-mirror microlithography projection objective
#21 | 2007-02-138-mirror microlithography projection objective
#22 | 2006-12-19Projection system for EUV lithography
#23 | 2006-10-19Catoptric objectives and systems using catoptric objectives
#24 | 2006-09-28Objective in a microlithographic projection exposure apparatus
#25 | 2006-08-03Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
#26 | 2006-03-30Reflective optical element and EUV lithography appliance
#27 | 2006-03-09Projection system for EUV lithography
#28 | 2006-01-10Projection system for EUV lithography
#29 | 2005-12-01Projection lens for a microlithographic projection exposure apparatus
#30 | 2005-09-15Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm
#31 | 2005-08-18Objective with pupil obscuration
#32 | 2005-05-17Objective with pupil obscuration
#33 | 2005-03-156-mirror microlithography projection objective
#34 | 2005-02-17Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
#35 | 2005-01-27Projection lens for a microlithographic projection exposure apparatus
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