Tokyo
Japan
19
2025-07-10
The entities that hold a legal rights for patent applications filed by inventor MAEDA Jun:
Jun MAEDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Workpiece Processing Method
#2 | 2025-05-22AZACYCLOALKYL CARBONYL CYCLIC AMINE COMPOUND
#3 | 2024-01-18EVAPORATIVE CONCENTRATION MECHANISM, ANALYZER INCLUDING THE SAME, AND METHOD OF CONTROLLING EVAPORATIVE CONCENTRATION MECHANISM
#4 | 2023-03-23Liquid feeding apparatus and liquid feeding method
#5 | 2021-09-02Chemical Analysis Device
#6 | 2021-08-26Semiconductor processing adhesive tape and method of manufacturing semiconductor device
#7 | 2021-07-08Adhesive tape for semiconductor processing and method for producing semiconductor device
#8 | 2021-02-11Adhesive tape for semiconductor processing, and semiconductor device manufacturing method
#9 | 2020-02-06Adhesive tape for semiconductor processing, and semiconductor device manufacturing method
#10 | 2019-12-19Adhesive tape for semiconductor processing, and semiconductor device manufacturing method
#11 | 2017-07-132-acylaminothiazole derivative or salt thereof
#12 | 2016-01-072-acylaminothiazole derivative or salt thereof
#13 | 2012-02-09CONDENSED PYRROLOPYRIDINE DERIVATIVE
#14 | 2011-07-07HETEROCYCLIC CARBOXAMIDE COMPOUNDS
#15 | 2011-06-302,4-DIAMINOPYRIMIDINE COMPOUND
#16 | 2010-01-14Pyridyl non-aromatic nitrogen-containing heterocyclic-1-carboxylate compound
#17 | 2010-01-14Pyridyl non-aromatic nitrogen-containing heterocyclic-1-carboxylate compound
#18 | 2009-04-23Amide derivatives as rock inhibitors
#19 | 2008-12-11Pyridyl non-aromatic nitrogen-containing heterocyclic-1-carboxylate compound
1408198 ⎘