SILKE HEY

City:

EINDHOVEN

Country:

Netherlands

Published Applications:

Last publication date:

2018-01-18

Top Assignees for applications by SILKE HEY

The entities that hold a legal rights for patent applications filed by inventor HEY SILKE:

SILKE HEY from EINDHOVEN, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

Metal artifact correction in magnetic resonance imaging

Magnetic resonance imaging system with ghost artifact reduction and method operation thereof

InventorID:

1440047 ⎘