Boise, Idaho
United States
39
2019-02-14
The entities that hold a legal rights for patent applications filed by inventor Millward Dan:
Dan Millward from Boise, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Methods of removing particles from over semiconductor substrates
#2 | 2016-01-28Methods of forming patterns with a mask formed utilizing a brush layer
#3 | 2015-06-25Methods of forming patterns by using a brush layer and masks
#4 | 2015-05-14Methods of removing particles from over semiconductor substrates
#5 | 2015-01-15Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography
#6 | 2014-11-27Methods of Utilizing Block Copolymer to Form Patterns
#7 | 2014-09-04LITHOGRAPHY WAVE-FRONT CONTROL SYSTEM AND METHOD
#8 | 2014-07-24Methods of utilizing block copolymer to form patterns
#9 | 2013-12-05Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns
#10 | 2013-11-14Semiconductor constructions and methods of forming patterns
#11 | 2013-10-17Methods using block co-polymer self-assembly for sub-lithographic patterning
#12 | 2013-07-18Methods of patterning substrates
#13 | 2013-02-14Methods of processing substrates
#14 | 2013-01-03Block copolymer-comprising compositions and methods of purifying PS--PXVP
#15 | 2012-12-13Lithography wave-front control system and method
#16 | 2012-10-25Methods of removing particles from over semiconductor substrates
#17 | 2012-10-11Illumination design for lens heating mitigation
#18 | 2012-03-29Methods of forming patterns
#19 | 2012-03-01Reticles, and methods of mitigating asymmetric lens heating in photolithography
#20 | 2012-02-23Methods of forming patterns, and methods of forming integrated circuits
#21 | 2012-02-16Lens heating compensation in photolithography
#22 | 2012-01-19Semiconductor constructions and methods of forming patterns
#23 | 2011-12-08Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
#24 | 2011-12-01Zwitterionic block copolymers and methods
#25 | 2011-11-10Methods of utilizing block copolymer to form patterns
#26 | 2011-10-13Methods of forming patterns, and methods of forming integrated circuits
#27 | 2011-06-16Zwitterionic block copolymers and methods
#28 | 2011-03-24Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#29 | 2010-12-23Methods of forming dispersions of nanoparticles, and methods of forming flash memory cells
#30 | 2010-12-23Methods of utilizing block copolymer to form patterns
#31 | 2010-07-08Methods of removing particles from over semiconductor substrates
#32 | 2010-06-03Block copolymer-comprising compositions and methods of purifying PS--PXVP
#33 | 2010-05-20Methods of utilizing block copolymer to form patterns
#34 | 2010-04-15Methods of utilizing block copolymer to form patterns
#35 | 2009-08-27Methods of forming dispersions of nanoparticles, and methods of forming flash memory cells
#36 | 2009-03-19β-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
#37 | 2008-09-04Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#38 | 2006-12-28Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#39 | 2006-12-28Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
14491 ⎘